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Smooth diamond films grown by hot filament chemical vapor deposition on positively biased silicon substrates

Published online by Cambridge University Press:  03 March 2011

Galina Popovici ,
C.H. Chao ,
M.A. Prelas ,
E.J. Charlson  and
J.M. Meese
Galina Popovici
Affiliation:
Nuclear Engineering Department, University of Missouri, Columbia, Missouri 65211
C.H. Chao
Affiliation:
Electrical Engineering Department, University of Missouri, Columbia, Missouri 65211
M.A. Prelas
Affiliation:
Nuclear Engineering Department, University of Missouri, Columbia, Missouri 65211
E.J. Charlson
Affiliation:
Electrical Engineering Department, University of Missouri, Columbia, Missouri 65211
J.M. Meese
Affiliation:
Electrical Engineering Department, University of Missouri, Columbia, Missouri 65211
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Abstract

Diamond films have been grown by hot filament chemical vapor deposition (CVD) on mirror-polished positively biased Si substrates. Very smooth films a few micrometers thick were obtained in only 30 min. SEM, x-ray diffraction patterns, and Raman were used to characterize the films. Not only diamond but other carbon phases, were also detected. The initial structure showed a high density of defects and large stresses. Structural changes in time were found to occur with films apparently undergoing a phase transformation.

Type
Articles
Information
Journal of Materials Research , Volume 10 , Issue 8 , August 1995 , pp. 2011 - 2016
Copyright
Copyright © Materials Research Society 1995

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References

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