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Slow crack growth of CVD diamond

Published online by Cambridge University Press:  31 January 2011

M.D. Drory  and
C.F. Gardinier
M.D. Drory
Affiliation:
Crystallume, 125 Constitution Drive, Menlo Park, California 94025
C.F. Gardinier
Affiliation:
Crystallume, 125 Constitution Drive, Menlo Park, California 94025
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Abstract

Slow crack growth in CVD diamond has been observed from indentation experiments. Diamond films of 400 μm thickness were prepared by plasma-enhanced CVD on a silicon substrate, subsequently removed from the substrate, and polished for indentation testing. A microhardness tester was used to produce Vickers indentations under low load. Crack length measurements over time revealed susceptibility to slow crack growth in ambient testing conditions. The stress-corrosion susceptibility coefficient, N, was measured as 9.3.

Type
Communications
Information
Journal of Materials Research , Volume 7 , Issue 4 , April 1992 , pp. 781 - 783
Copyright
Copyright © Materials Research Society 1992

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