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Single-step fabrication of potassium tantalate films by hydrothermal-electrochemical method at lower temperatures

Published online by Cambridge University Press:  31 January 2011

Zhibin Wu ,
Tetsuji Tsukada  and
Masahiro Yoshimura
Zhibin Wu
Affiliation:
Center for Materials Design, Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 228-8503, Japan
Tetsuji Tsukada
Affiliation:
Center for Materials Design, Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 228-8503, Japan
Masahiro Yoshimura
Affiliation:
Center for Materials Design, Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 228-8503, Japan
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Abstract

Potassium tantalate thin films (KT) were hydrothermal-electrochemically and electrochemically synthesized on tantalum substrates under galvanostatic conditions in KOH solutions at temperatures from 50 to 150 °C. The pyrochlore structures were characterized by x-ray diffraction and scanning electron microscopy for the films formed under a variety of conditions. It was found that the reaction temperature, potassium hydroxide concentration, and current density significantly affect the formation and the morphology of the KT films. When the reaction temperatures were higher than 80 °C and the KOH concentrations were greater than 2.0 M, very crystalline films with excellent film flatness and good adherence on the substrate were obtained. Based on the experimental results, it was confirmed that the formation and growth of KT films by the hydrothermal-electrochemical and electrochemical method follow a dissolution-crystallization mechanism.

Type
Articles
Information
Journal of Materials Research , Volume 15 , Issue 5 , May 2000 , pp. 1154 - 1160
Copyright
Copyright © Materials Research Society 2000

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