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Preferred Orientation of Copper Phthalocyanine Thin Films Evaporated on Amorphous Substrates

Published online by Cambridge University Press:  31 January 2011

R. Resel ,
M. Ottmar ,
M. Hanack ,
J. Keckes  and
G. Leising
R. Resel*
Affiliation:
Institut für Festkörperphysik, Technische Universität Graz, Petersgasse 16, A-8010 Graz, Austria
M. Ottmar
Affiliation:
Institut für Organische Chemie, Universität Tübingen, Tübingen, Germany
M. Hanack
Affiliation:
Institut für Organische Chemie, Universität Tübingen, Tübingen, Germany
J. Keckes
Affiliation:
Erich-Schmid-Institut für Materialwissenschaften, Österreichische Akademie der Wissenschaften and Institut für Metallphysik, Montanuniversität Leoben, Austria
G. Leising
Affiliation:
Institut für Festkörperphysik, Technische Universität Graz, Petersgasse 16, A-8010 Graz, Austria
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

A series of copper phthalocyanine thin films were prepared on amorphous substrates using physical vapor deposition at ambient temperature. Different sample preparation conditions were used: the deposition rate was varied, and the substrates was static or rotating. The preferred orientation in the thin film was studied as a function of the deposition conditions. X-ray diffraction analysis was performed using θ/2θ and pole figure measurements. In the case of layers prepared at low deposition rates and using nonrotating substrates, a very strong fiber texture was detected with (100) crystallographic planes oriented preferably parallel to the substrate surface. At higher deposition rates, an additional second type of preferred orientation was observed with (110) planes oriented preferably parallel to the substrate surface. In the case of layers prepared with rotational substrates, the (110) type of preferred orientation was quantitatively more strongly developed. If we consider electronic band structure calculations, these results imply that the electron/hole transport through the thin films is enhanced for films prepared at high deposition rates and rotating substrates.

Type
Articles
Information
Journal of Materials Research , Volume 15 , Issue 4 , April 2000 , pp. 934 - 939
Copyright
Copyright © Materials Research Society 2000

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