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Phase configuration, nanostructure, and mechanical behaviors in Ti-B-C-N thin films

Published online by Cambridge University Press:  31 January 2011

Yonghao Lu*
Affiliation:
Scientific Center for Materials Service Safety, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
Junping Wang
Affiliation:
Science School, Beijing University of Civil Engineering and Architecture, Beijing 100044, People's Republic of China
Yaogen Shen
Affiliation:
Department of Manufacturing Engineering & Engineering Management, City University of Hong Kong, Kowloon, Hong Kong
Dongbai Sun
Affiliation:
Science Center for Materials Service Safety, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
*
a) Address all correspondence to this author. e-mail: [email protected]
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Abstract

A series of Ti-B-C-N thin films were deposited on Si (100) at 500 °C by incorporation of different amounts of N into Ti-B-C using reactive unbalanced dc magnetron sputtering in an Ar-N2 gas mixture. The effect of N content on phase configuration, nanostructure evolution, and mechanical behaviors was studied by x-ray diffraction, x-ray photoelectron spectroscopy, Raman spectroscopy, high-resolution transmission electron microscopy, and microindentation. It was found that the pure Ti-B-C was two-phased quasi-amorphous thin films comprising TiCx and TiB2. Incorporation of a small amount of N not only dissolved into TiCx but also promoted growth of TiCx nano-grains. As a result, nanocomposite thin films of nanocrystalline (nc-) TiCx(Ny) (x + y < 1) embedded into amorphous (a-) TiB2 were observed until nitrogen fully filled all carbon vacancy lattice (at that time x + y = 1). Additional increase of N content promoted formation of a-BN at the cost of TiB2, which produced nanocomposite thin films of nc-Ti(Cx,N1-x) embedded into a-(TiB2, BN). Formation of BN also decreased nanocrystalline size. Both microhardness and elastic modulus values were increased with an increase of N content and got their maximums at nanocomposite thin films consisting of nc-Ti(Cx,N1-x) and a-TiB2. Both values were decreased after formation of BN. Residual compressive stress value was successively decreased with an increase of N content. Enhancement of hardness was attributed to formation of nanocomposite structure and solid solution hardening.

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Articles
Copyright
Copyright © Materials Research Society 2009

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References

1Kuo, D.H. and Huang, K.W.: A new class of the Ti-Si-C-N coatings by chemical vapor deposition, Part II: Low-temperature process. Thin Solid Films 394, 81 (2001).Google Scholar
2Lu, Y.H. and Shen, Y.G.: Nanostructure transition: From solid solution Ti(N,C) to nanocomposite nc-Ti(N,C)/a-(C,CNx). Appl.Phys. Lett. 90, 221913 (2007).Google Scholar
3Dobrazański, L.A. and Adamiak, M.: Structure and properties of the TiN and Ti(C,N) coatings deposited in the PVD process on high-speed steels. J. Mater. Process. Technol. 133, 50 (2003).CrossRefGoogle Scholar
4Hultman, L.: Thermal stability of nitride thin films. Vacuum 57, 1 (2000).Google Scholar
5Lu, Y.H., Liu, Z-J., and Shen, Y.G.: Investigation of nanostructure evolution and twinning of nanocrystallites in Ti-Bx-Ny nanocom-posite thin films deposited by magnetron sputtering at low temperature by means of HRTEM and Monte Carlo simulations. Acta Mater. 54, 2897 (2006).CrossRefGoogle Scholar
6Mayrhofe, P.H., Mitterer, C., Wen, J.G., Petrov, I., and Greene, J.E.: Thermally induced self-hardening of nanocrystalline Ti-B-N thin films. J. Appl. Phys. 100, 0443011 (2006).Google Scholar
7Park, I.W., Kim, K.H., Kunrath, A.O., Zhong, D., Moore, J.J., Voevodin, A.A., and Levasjov, E.A.: Microstructure and mechanical properties of superhard Ti-B-C-N films deposited by dc unbalanced magnetron sputtering. J. Vac. Sci. Technol., B 23(2), 588 (2005).Google Scholar
8Zhang, D., Sutter, E., Moore, J.J., Mustoe, G.G.W., Levashov, E.A., and Disam, J.: Mechanical properties of Ti-B-C-N coatings deposited by magnetron sputtering. Thin Solid Films 398–399, 320 (2001).Google Scholar
9Nesládek, P. and Vepřek, S.: Superhard nanocrystalline composites with hardness of diamond. Phys. Status Solidi A 177, 53 (2000).3.0.CO;2-H>CrossRefGoogle Scholar
10Vepřek, S., Nesládek, P., Niederhofer, A., Glatz, F., Jílek, M., and Síma, M.: Recent progress in the superhard nanocrystalline composite: Towards their industrialization and understanding of the origin of the superhardness. Surf. Coat. Technol. 108–109, 138 (1998).CrossRefGoogle Scholar
11Vepřek, S.: The search of novel superhard materials. J. Vac. Sci. Technol., A 17(5), 2401 (1999).CrossRefGoogle Scholar
12Vepřek, S., Christiansen, S., Albrecht, M., and Strunk, H.P.: Percolation threshold in superhard nanocrystalline transition metal-amorphous silicon nitride composite: The control and understanding of the superhardness, in Nanophase and Nanocom-posite Materials II, edited by Komarneni, S., Parker, J.C., and Wollenberger, H.J. (Mater. Res. Soc. Symp. Proc. 457, Pittsburgh, PA, 1997), p. 407.Google Scholar
13Lu, Y.H., Zhou, Z.F., Sit, P., Shen, Y.G., Li, K.Y., and Chen, H.: X-ray photoelectron spectroscopy characterization of reactively sputtered Ti–B–N thin films. Surf. Coat. Technol. 187, 98 (2004).CrossRefGoogle Scholar
14Mitterer, C., Mayrhofer, P.H., Beschliesser, M., Losbichler, P., Warbichler, P., Hofer, F., Gibson, P.N., Gissler, W., Hruby, H., Musil, J., and Vlček, J.: Structural properties internal stress and thermal stability of nc-TiN/a-Si3N4, nc-TiN/TiSix and nc-Ti(Ti1-yAlySix) superhard nanocomposite coatings reaching the hardness of diamond. Surf. Coat. Technol. 120–121, 405 (1999).CrossRefGoogle Scholar
15Dean, J.A.: Lang's Handbook of Chemistry, 15th ed. (McGraw-Hill. Inc., New York, 1999).Google Scholar
16Vepřek, S., Haussmann, M., and Reiprich, S.: Superhard nanocrys-talline W2N/amorphous Si3N4 composite materials. J. Vac. Sci. Technol., A 14(1), 46 (1996).CrossRefGoogle Scholar
17Lu, Y.H., Shen, Y.G., Wang, J.P., Zhou, Z.F., and Li, K.Y.: Struc-ture and hardness of unbalanced magnetron sputtered TiBxNy thin films deposited at 500 C. Surf. Coat. Techol. 201, 7368 (2007).Google Scholar
18Thornton, J.A. and Hoffman, D.W.: Stress-related effects in thin films. Thin Solid Films 171, 5 (1989).Google Scholar