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Passivation of nanocrystalline Al prepared by the gas phase condensation method: An x-ray photoelectron spectroscopy study

Published online by Cambridge University Press:  31 January 2011

J. C. Sánchez-López ,
A. R. González-Elipe  and
A. Fernández
J. C. Sánchez-López
Affiliation:
Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. de Sevilla), Centro de Investigaciones Cientificas “Isla de la Cartuja,” Avda. Américo Vespuccio, s/n. 41092 Sevilla, Spain
A. R. González-Elipe
Affiliation:
Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. de Sevilla), Centro de Investigaciones Cientificas “Isla de la Cartuja,” Avda. Américo Vespuccio, s/n. 41092 Sevilla, Spain
A. Fernández*
Affiliation:
Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. de Sevilla), Centro de Investigaciones Cientificas “Isla de la Cartuja,” Avda. Américo Vespuccio, s/n. 41092 Sevilla, Spain
*
a) Author to whom correspondence should be addressed.[email protected]
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Abstract

Nanocrystalline aluminum powders have been prepared by the gas phase condensation method. Samples have been synthesized in a conventional preparation chamber for gas phase condensation and also in the pretreatment chamber of an XPS (x-ray photoelectron spectroscopy) spectrometer so that in situ studies of the passivation process of nanocrystalline aluminum can be performed. For the range of particle sizes (12–41 nm) studied in the present work, we found a universal behavior during passivation with oxygen of the nanocrystalline Al0. An Al2O3 overlayer of 4 nm, which protects the material from further oxidation, was obtained for all samples independently of the route of oxygen dosage. A careful analysis of the photoelectron parameters (binding energy and Auger parameters) for Al and O shows that in the early stages of passivation the alumina overlayer is so thin (<2.5 nm thickness) that the Al2O3 –Al interface induces an increase in the relaxation energy of the photoholes as compared to that of bulk alumina. Conclusions have been drawn about the best way to proceed during passivation of Al ultrafine particles before exposure to an air atmosphere.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 3 , March 1998 , pp. 703 - 710
Copyright
Copyright © Materials Research Society 1998

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