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Optical absorbance enhancement by electrochemical surface roughening of CuInS2 thin films

Published online by Cambridge University Press:  31 January 2011

Romain Cayzac ,
Florence Boulc'h ,
Virginie Hornebecq ,
Thierry Djenizian ,
Marc Bendahan ,
Marcel Pasquinelli  and
Philippe Knauth
Romain Cayzac*
Affiliation:
Université d'Aix-Marseille I, II, III – CNRS, UMR 6264, Laboratoire Chimie Provence, Centre de Saint Jérôme, Marseille 13397, France
Thierry Djenizian
Affiliation:
Université d'Aix-Marseille I, II, III – CNRS, UMR 6264, Laboratoire Chimie Provence, Centre de Saint Jérôme, Marseille 13397, France
Marcel Pasquinelli
Affiliation:
Université d'Aix-Marseille I, II, III – CNRS, UMR 6242, Institut Matériaux Microélectronique Nanosciences de Provence, Centre de Saint Jérôme, Marseille, France
Philippe Knauth
Affiliation:
Université d'Aix-Marseille I, II, III – CNRS, UMR 6264, Laboratoire Chimie Provence, Centre de Saint Jérôme, Marseille 13397, France
*
a) Address all correspondence to this author. e-mail: [email protected]
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Abstract

This work presents a simple electrochemical etching method to increase the surface roughness of copper indium disulphide (CIS) thin films using low concentration of hydrochloric acid. Film morphologies were investigated using scanning electron microscopy and atomic force microscopy. The structure of films was investigated using x-ray diffraction. A comparative study of optical properties of as-deposited and roughened CIS thin films by transmittance and reflectance experiments show a strong enhancement of absorbance for wavelengths between 600 and 900 nm.

Keywords

MorphologyOptical propertiesPhotovoltaic
Type
Articles
Information
Journal of Materials Research , Volume 24 , Issue 10 , October 2009 , pp. 3044 - 3049
Copyright
Copyright © Materials Research Society 2009

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