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On growth of epitaxial vanadium oxide thin film on sapphire (0001)

Published online by Cambridge University Press:  31 January 2011

Tsung-Han Yang*
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, EB-I, Centennial Campus, Raleigh, North Carolina 27695-7907
Chunming Jin
Affiliation:
Joint Department of Biomedical Engineering, University of North Carolina, Chapel Hill, North Carolina 27599
Ravi Aggarwal
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, EB-I, Centennial Campus, Raleigh, North Carolina 27695-7907
R.J. Narayan
Affiliation:
Joint Department of Biomedical Engineering, University of North Carolina, Chapel Hill, North Carolina 27599
Jay Narayan
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, EB-I, Centennial Campus, Raleigh, North Carolina 27695-7907
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

We report the characteristics of epitaxial growth and properties of vanadium oxide (VO2) thin films on sapphire (0001) substrates. Pulsed laser deposition was used to grow (002) oriented VO2 films on sapphire (0001). Transmission electron microscopy studies showed that the orientation relationship between the substrate and the thin film is: (002)f2∥(0006)sub3 and [010]f2sub. It was also established that VO2 has three different orientations in the film plane which are rotated by 60° from each other. The epitaxial growth of vanadium oxide on sapphire (0001) has been explained in the framework of domain matching epitaxy (DME). Electrical resistivity measurements as a function of temperature showed a sharp transition with a hysteresis width ˜5 °C, and large resistance change (˜1.5 × 104) from the semiconductor phase to the metal phase. It is interesting to note that in spite of large angle twin boundaries in these VO2 films, the SMT characteristics are better than those observed for polycrystalline films. The higher width of thermal hysteresis for the VO2 film on c-sapphire compared to a bulk single VO2 crystal and a single-crystal VO2 film on r-sapphire can be attributed to the existence of these large-angle twin grain boundaries. These findings can provide insight into the phase transformation characteristics of VO2, which has important applications in switching and memory devices.

Type
Materials Communications
Copyright
Copyright © Materials Research Society 2010

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References

REFERENCES

1.Morin, F.J.Oxides which show a metal-to-insulator transition at the Neel temperature. Phys. Rev. Lett. 3, 34 (1959)CrossRefGoogle Scholar
2.Goodenough, J.B.Direct cation-cation interactions in several oxides. Phys. Rev. 117, 1442 (1960)CrossRefGoogle Scholar
3.Heckingbottom, R., Linnett, J.W.Structure of vanadium dioxide. Nature 194, 678 (1962)CrossRefGoogle Scholar
4.Nag, J., Haglund, R.F. Jr.Synthesis of vanadium dioxide thin films and nanoparticles. J. Phys. Condens. Matter 20, 264016 (2008)CrossRefGoogle Scholar
5.Westman, S.Note on a phase transition in VO2. Acta Chem. Scand. 15, 217 (1961)CrossRefGoogle Scholar
6.Eyert, V.The metal-insulator transitions of VO2: A band theoretical approach. Ann. Phys. 11, 650 (2002)CrossRefGoogle Scholar
7.Narayan, J., Bhosle, V.M.Phase transition and critical issues in structure-property correlations of vanadium oxide. J. Appl. Phys. 100, 103524 (2006)CrossRefGoogle Scholar
8.Jin, P., Yoshimura, K., Tanemura, S.Dependence of microstructure and thermochromism on substrate temperature for sputter-deposited VO2 epitaxial films. J. Vac. Sci. Technol., A 15, (31)1113 (1997)CrossRefGoogle Scholar
9.Kim, D.H., Kwok, H.S.Pulsed laser deposition of VO2 thin films. Appl. Phys. Lett. 65, 3188 (1994)CrossRefGoogle Scholar
10.Lee, W.E., Lagerlof, K.P.D.Structural and electron diffraction data for sapphire (α-Al2O3). J. Electron Microsc. Tech. 2, 247 (1985)CrossRefGoogle Scholar
11.Guo, J., Chang, H.L.M., Lam, D.J.Substrate surface step effects on microstructure of epitaxial films. Appl. Phys. Lett. 61, 3116 (1992)CrossRefGoogle Scholar
12.Narayan, J., Larson, B.C.Domain epitaxy: A unified paradigm for thin film growth. J. Appl. Phys. 93, 278 (2003)CrossRefGoogle Scholar
13.Jin, P., Tanemura, S.Relationship between transition temperature and x in V1-xWxO2 films deposited by dual-target magnetron sputtering. Jpn. J. Appl. Phys., Part 1 34, 2459 (1995)CrossRefGoogle Scholar
14.Wu, Z.P., Yamamoto, S., Miyashita, A., Zhang, Z.J., Narumi, K., Naramoto, H.Single-crystalline epitaxy and twinned structure of vanadium dioxide thin film on (0001) sapphire. J. Phys. Condens. Matter 10, L765 (1998)CrossRefGoogle Scholar
15.Morris Hostenpiller, P.A., Roshko, A., Lowekamp, J.B., Rohrer, G.S.Growth morphologies of heteroepitaxial rutile films on sapphire substrates. J. Cryst. Growth 174, 424 (1997)Google Scholar
16.Yang, T., Aggarwal, R., Gupta, A., Zhou, H., Narayan, R., Narayan, J.Semiconductor to metal transition characteristics of VO2 thin films on c- and r-sapphire. J. Appl. Phys (submitted)Google Scholar