Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Chang, Chun-Wei
Hong, Min-Hao
Lee, Wei-Fan
Lee, Kuan-Ching
Jang Jian, Shiu-Ko
Chuang, Yen
Fan, Yu-Ta
Hasuike, Noriyuki
Harima, Hiroshi
Ueda, Takeshi
Ishigaki, Toshikazu
Kang, Kitaek
and
Sik Yoo, Woo
2012.
Contactless monitoring of Ge content and B concentration in ultrathin single and double layer Si1-xGex epitaxial films using multiwavelength micro-Raman spectroscopy.
AIP Advances,
Vol. 2,
Issue. 1,
Chang, Chun-Wei
Hong, Min-Hao
Lee, Wei-Fan
Lee, Kuan-Ching
Yang, Shen-Min
Tsai, Ming-Shan
Chuang, Yen
Fan, Yu-Ta
Hasuike, Noriyuki
Harima, Hiroshi
Ueda, Takeshi
Ishigaki, Toshikazu
Kang, Kitaek
and
Yoo, Woo Sik
2012.
In-line Si1-xGex epitaxial process monitoring and diagnostics using multiwavelength high resolution micro-Raman spectroscopy.
AIP Advances,
Vol. 2,
Issue. 2,
Chang, Chun-Wei
Hong, Min-Hao
Lee, Wei-Fan
Lee, Kuan-Ching
Tseng, Li-De
Chen, Yi-Hann
Chuang, Yen
Fan, Yu-Ta
Ueda, Takeshi
Ishigaki, Toshikazu
Kang, Kitaek
and
Yoo, Woo Sik
2012.
Micro-Raman characterization of Ge diffusion and Si stress change in thin epitaxial Si1−xGex layers on Si(100) after rapid thermal annealing.
Journal of Materials Research,
Vol. 27,
Issue. 9,
p.
1314.
Chang, Chun-Wei
Hong, Min-Hao
Tsai, Ming-Shan
Lee, Kuan-Ching
Lee, Wei-Fan
Chuang, Yen
Fan, Yu-Ta
Ueda, Takeshi
Ishigaki, Toshikazu
Kang, Kitaek
and
Yoo, Woo Sik
2012.
Multiwavelength Micro-Raman Characterization of Epitaxial Si1−x Ge x Layers on Si(100) and In-Line Process Monitoring Applications.
Journal of Electronic Materials,
Vol. 41,
Issue. 11,
p.
3125.
Hong, Min-Hao
Chang, Chun-Wei
Perng, Dung-Ching
Lee, Kuan-Ching
Jian, Shiu-Ko Jang
Lee, Wei-Fan
Chuang, Yen
Fan, Yu-Ta
and
Yoo, Woo Sik
2012.
Non-contact monitoring of Ge and B diffusion in B-doped epitaxial Si1-xGex bi-layers on silicon substrates during rapid thermal annealing by multiwavelength Raman spectroscopy.
AIP Advances,
Vol. 2,
Issue. 3,
Jang Jian, Shiu-Ko
Jeng, Chih-Cherng
Wang, Ting-Chun
Huang, Chih-Mu
Wang, Ying-Lang
and
Sik Yoo, Woo
2013.
Visualization of Plasma Etching Damage of Si Using Room Temperature Photoluminescence and Raman Spectroscopy.
ECS Journal of Solid State Science and Technology,
Vol. 2,
Issue. 5,
p.
P214.
Yoo, Woo Sik
Kang, Kitaek
Ueda, Takeshi
Ishigaki, Toshikazu
Nishigaki, Hiroshi
Hasuike, Noriyuki
Harima, Hiroshi
Yoshimoto, Masahiro
and
Tan, Chuan Seng
2015.
Characterization of Hetero-Epitaxial Ge Films on Si Using Multiwavelength Micro-Raman Spectroscopy.
ECS Journal of Solid State Science and Technology,
Vol. 4,
Issue. 2,
p.
P9.
Yoo, Woo Sik
Kang, Kitaek
Ishigaki, Toshikazu
Kim, Jung Gon
Hasuike, Noriyuki
Harima, Hiroshi
and
Yoshimoto, Masahiro
2020.
Thermal Silicidation of Ni/SiGe and Characterization of Resulting Nickel Germanosilicides.
ECS Journal of Solid State Science and Technology,
Vol. 9,
Issue. 12,
p.
123001.
La Penna, Giancarlo
Mancini, Chiara
Proietti, Anacleto
Buccini, Luca
Passeri, Daniele
Gambacorti, Narciso
Richy, Jérôme
and
Rossi, Marco
2024.
Strained Silicon Technology: Non-Destructive High-Lateral-Resolution Characterization Through Tip-Enhanced Raman Spectroscopy.
Applied Spectroscopy,