Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Mwabora, Julius M.
Lindgren, Torbjörn
Avendaño, Esteban
Jaramillo, Thomas F.
Lu, Jun
Lindquist, Sten-Eric
and
Granqvist, Claes-Göran
2004.
Structure, Composition, and Morphology of Photoelectrochemically Active TiO2-xNx Thin Films Deposited by Reactive DC Magnetron Sputtering.
The Journal of Physical Chemistry B,
Vol. 108,
Issue. 52,
p.
20193.
Mohamed, S.H.
Kappertz, O.
Niemeier, T.
Drese, R.
Wakkad, M.M.
and
Wuttig, M.
2004.
Effect of heat treatment on structural, optical and mechanical properties of sputtered TiOxNy films.
Thin Solid Films,
Vol. 468,
Issue. 1-2,
p.
48.
Hsieh, J.H.
Li, C.
Wang, C.M.
and
Tang, Z.Z.
2005.
Boundary-free multi-element barrier films by reactive co-sputtering.
Surface and Coatings Technology,
Vol. 198,
Issue. 1-3,
p.
335.
Lee, Hoo-Jeong
Ni, Hai
Wu, David T.
and
Ramirez, Ainissa G.
2005.
Experimental determination of kinetic parameters for crystallizing amorphous NiTi thin films.
Applied Physics Letters,
Vol. 87,
Issue. 11,
Wu, P.-G.
Ma, C.-H.
and
Shang, J.K.
2005.
Effects of nitrogen doping on optical properties of TiO2 thin films.
Applied Physics A,
Vol. 81,
Issue. 7,
p.
1411.
He, G.
Fang, Q.
and
Zhang, L.D.
2006.
Structural and interfacial properties of high-k HfOxNy gate dielectric films.
Materials Science in Semiconductor Processing,
Vol. 9,
Issue. 6,
p.
870.
Chiu, Sung-Mao
Chen, Zhi-Sheng
Yang, Kuo-Yuan
Hsu, Yu-Lung
and
Gan, Dershin
2007.
Photocatalytic activity of doped TiO2 coatings prepared by sputtering deposition.
Journal of Materials Processing Technology,
Vol. 192-193,
Issue. ,
p.
60.
Liu, C. S.
Li, J.
and
Deng, S. Y.
2007.
Modification of nanosized anatase titanium dioxide by microwave irradiation.
Materials Technology,
Vol. 22,
Issue. 3,
p.
147.
He, G.
Fang, Q.
Li, G.H.
Zhang, J.P.
and
Zhang, L.D.
2007.
Structural and optical properties of nitrogen-incorporated HfO2 gate dielectrics deposited by reactive sputtering.
Applied Surface Science,
Vol. 253,
Issue. 20,
p.
8483.
He, G
Zhang, L D
Li, G H
Liu, M
and
Wang, X J
2008.
Structure, composition and evolution of dispersive optical constants of sputtered TiO2thin films: effects of nitrogen doping.
Journal of Physics D: Applied Physics,
Vol. 41,
Issue. 4,
p.
045304.
He, G.
Zhang, L. D.
Meng, G. W.
Li, G. H.
Fei, G. T.
Wang, X. J.
Zhang, J. P.
Liu, M.
Fang, Q.
and
Boyd, Ian W.
2008.
Composition dependence of electronic structure and optical properties of Hf1−xSixOy gate dielectrics.
Journal of Applied Physics,
Vol. 104,
Issue. 10,
Nejand, B. Abdollahi
Sanjabi, S.
and
Ahmadi, V.
2011.
Sputter deposition of high transparent TiO2−xNx/TiO2/ZnO layers on glass for development of photocatalytic self-cleaning application.
Applied Surface Science,
Vol. 257,
Issue. 24,
p.
10434.
Hoang, Ngoc Lam Huong
Hirose, Yasushi
Nakao, Shoichiro
and
Hasegawa, Tetsuya
2011.
Crystallization Kinetics of Amorphous Sputtered Nb-Doped TiO$_{2}$ Thin Films.
Applied Physics Express,
Vol. 4,
Issue. 10,
p.
105601.
Akazawa, Housei
2012.
Sputtering characteristics, crystal structures, and transparent conductive properties of TiO N films deposited on α-Al2O3(0 0 0 1) and glass substrates.
Applied Surface Science,
Vol. 263,
Issue. ,
p.
307.
Aubry, E.
Lambert, J.
Demange, V.
and
Billard, A.
2012.
Effect of Na diffusion from glass substrate on the microstructural and photocatalytic properties of post-annealed TiO2 films synthesised by reactive sputtering.
Surface and Coatings Technology,
Vol. 206,
Issue. 23,
p.
4999.
Rawal, Sushant K
Chawla, Amit Kumar
Jayaganthan, R.
and
Chandra, Ramesh
2012.
Structural, Wettability and Optical Investigation of Titanium Oxynitride Coatings: Effect of Various Sputtering Parameters.
Journal of Materials Science & Technology,
Vol. 28,
Issue. 6,
p.
512.
Fang, Feng
Wu, Xiao Qin
Li, Qi
and
Shang, Jian Ku
2013.
Effect of Acceleration Voltage on Properties of Nitrogen-Doped TiO<sub>2</sub> Thin Films.
Advanced Materials Research,
Vol. 699,
Issue. ,
p.
496.
Fager, H.
Andersson, J.M.
Lu, J.
Jöesaar, M.P. Johansson
Odén, M.
and
Hultman, L.
2013.
Growth of hard amorphous TiAlSiN thin films by cathodic arc evaporation.
Surface and Coatings Technology,
Vol. 235,
Issue. ,
p.
376.
Duarte, D. A.
Massi, M.
and
da Silva Sobrinho, A. S.
2014.
Development of Dye-Sensitized Solar Cells with Sputtered N-DopedTiO2Thin Films: From Modeling the Growth Mechanism of the Films to Fabrication of the Solar Cells.
International Journal of Photoenergy,
Vol. 2014,
Issue. ,
p.
1.
Ghazzal, Mohamed Nawfal
Aubry, Eric
Chaoui, Nouari
and
Robert, Didier
2015.
Effect of SiNx diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol–gel dip coating and reactive magnetron sputtering.
Beilstein Journal of Nanotechnology,
Vol. 6,
Issue. ,
p.
2039.