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Nano/micro-mechanical and tribological characterization of Ar, C, N, and Ne ion-implanted Si

Published online by Cambridge University Press:  31 January 2011

Zhi-Hui Xu ,
Young-Bae Park  and
Xiaodong Li
Zhi-Hui Xu
Affiliation:
Department of Mechanical Engineering, University of South Carolina, Columbia, South Carolina 29208
Young-Bae Park
Affiliation:
Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, California 91125
Xiaodong Li*
Affiliation:
Department of Mechanical Engineering, University of South Carolina, Columbia, South Carolina 29208
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

Ion implantation has been widely used to improve the mechanical and tribological properties of single crystalline silicon, an essential material for the semiconductor industry. In this study, the effects of four different ion implantations, Ar, C, N, and Ne ions, on the mechanical and tribological properties of single crystal Si were investigated at both the nanoscale and the microscale. Nanoindentation and microindentation were used to measure the mechanical properties and fracture toughness of ion-implanted Si. Nano and micro scratch and wear tests were performed to study the tribological behaviors of different ion-implanted Si. The relationship between the mechanical properties and tribological behavior and the damage mechanism of scratch and wear were also discussed.

Keywords

Ion implantationTribology
Type
Articles
Information
Journal of Materials Research , Volume 25 , Issue 5 , May 2010 , pp. 880 - 889
Copyright
Copyright © Materials Research Society 2010

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