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Nanoimprinted complementary organic electronics: Single transistors and inverters

Published online by Cambridge University Press:  20 September 2011

Thomas Rothländer*
Affiliation:
MATERIALS—Institute for Surface Technologies and Photonics, JOANNEUM RESEARCH, Forschungsgesellschaft mbH, Weiz 8160, Austria
Ursula Palfinger
Affiliation:
MATERIALS—Institute for Surface Technologies and Photonics, JOANNEUM RESEARCH, Forschungsgesellschaft mbH, Weiz 8160, Austria
Barbara Stadlober
Affiliation:
MATERIALS—Institute for Surface Technologies and Photonics, JOANNEUM RESEARCH, Forschungsgesellschaft mbH, Weiz 8160, Austria
Anja Haase
Affiliation:
MATERIALS—Institute for Surface Technologies and Photonics, JOANNEUM RESEARCH, Forschungsgesellschaft mbH, Weiz 8160, Austria
Herbert Gold
Affiliation:
MATERIALS—Institute for Surface Technologies and Photonics, JOANNEUM RESEARCH, Forschungsgesellschaft mbH, Weiz 8160, Austria
Christian Palfinger
Affiliation:
MATERIALS—Institute for Surface Technologies and Photonics, JOANNEUM RESEARCH, Forschungsgesellschaft mbH, Weiz 8160, Austria
Johanna Kraxner
Affiliation:
MATERIALS—Institute for Surface Technologies and Photonics, JOANNEUM RESEARCH, Forschungsgesellschaft mbH, Weiz 8160, Austria
Georg Jakopic
Affiliation:
MATERIALS—Institute for Surface Technologies and Photonics, JOANNEUM RESEARCH, Forschungsgesellschaft mbH, Weiz 8160, Austria
Paul Hartmann
Affiliation:
MATERIALS—Institute for Surface Technologies and Photonics, JOANNEUM RESEARCH, Forschungsgesellschaft mbH, Weiz 8160, Austria
Gerhard Domann
Affiliation:
MATERIALS—Institute for Surface Technologies and Photonics, JOANNEUM RESEARCH, Forschungsgesellschaft mbH, Weiz 8160, Austria
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

We demonstrate the fabrication of shadow mask (SM) patterned as well as nanoimprint lithography (NIL) patterned organic transistors and integrated complementary organic inverters (ICOIs). As active layers pentacene (p-type) and either PTCDI-C13H27 or F16CuPc (n-type) were used. The SM-patterned ICOIs with a staggered bottom gate configuration, a nanocomposite dielectric and both active layer combinations (pentacene/PTCDI C13H27, pentacene/F16CuPc) exhibited high performance (3 V operation voltage; gain around 60; high level 3 V; low level 5 mV; noise margin 0.9 V). Flexible ICOIs with transistor channel lengths of 900 nm were successfully fabricated by NIL, using a benzocyclobutene derivative as dielectric. Because of the process inherent coplanar bottom gate configuration, F16CuPc was used. The ICOIs showed proper functionality (3 V operation voltage; gain around 5; high level 2.9 V; low level 25 mV). To our knowledge, this study demonstrates the first complementary submicron inverters based on fully R2R compatible imprint processes.

Type
Invited Feature Papers
Copyright
Copyright © Materials Research Society 2011

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