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Microstructures of a-axis oriented YBCO films made by hybrid plasma sputtering

Published online by Cambridge University Press:  03 March 2011

W. Ito
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10-13 Shinonome l chome, Koto-ku, Tokyo 135, Japan
A. Oishi
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10-13 Shinonome l chome, Koto-ku, Tokyo 135, Japan
S. Mahajan
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10-13 Shinonome l chome, Koto-ku, Tokyo 135, Japan
Y. Yoshida
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10-13 Shinonome l chome, Koto-ku, Tokyo 135, Japan
T. Morishita
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10-13 Shinonome l chome, Koto-ku, Tokyo 135, Japan
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Abstract

Microstructures of a-axis oriented YBa2Cu3O7−x films made by newly developed de 100 MHz hybrid plasma sputtering were investigated using transmission electron microscopy (TEM). The films deposited on (110) NdGaO3 and (100) SrTiO3 substrates were found to grow in a perfect epitaxial fashion and with clear interface. The plan view of the TEM image showed that both films were comprised of two kinds of grains having the c axis aligning along two perpendicular directions in the plane with equal probability. The structures of the grain boundary, however, were found to be very different for the two films from the plan views. The film on NdGaO3 showed a lot of twist boundaries, while the film on SrTiO3 consisted of many symmetrical tilt boundaries and basal-plane-faced tilt boundaries. The type of grain boundary is determined by the anisotropic growth rates of the film between c direction and a-b direction.

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Articles
Copyright
Copyright © Materials Research Society 1995

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References

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