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Ion bombardment-induced changes in oxide-metal interactions studied by photoelectron spectroscopy

Published online by Cambridge University Press:  31 January 2011

Sharmila M. Mukhopadhyay  and
Tim C.S. Chen
Sharmila M. Mukhopadhyay
Affiliation:
Department of Metallurgy and Materials Science, Polytechnic University, 6 Metrotech Center, Brooklyn, New York 11201
Tim C.S. Chen
Affiliation:
Department of Metallurgy and Materials Science, Polytechnic University, 6 Metrotech Center, Brooklyn, New York 11201
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Abstract

We have studied the influence of ion bombardment on the surfaces of MgO and Al2O3 single crystals. The two oxides were sputtered with low energy Ar+ ions, and x-ray photoelectron spectroscopy was used to analyze surface compositions and chemical interactions with metallic adsorbates. Expected changes in surface compositions have been calculated mathematically using first principle formulation from existing literature. The resulting effects on XPS spectra have been predicted based on concentration profile models and agree with experimental observations. Changes in surface oxygen activity were studied by evaporating Ni on these surfaces at an extremely slow rate and analyzing what fraction of the first monolayer was oxidized on adsorption. This fraction, used as a measure of surface oxygen activity, was substantially reduced in Al2O3 on sputtering, but remained practically unchanged for MgO. The amount of these changes matches reasonably well with calculated changes in surface oxygen fraction. Based on these results, the relation between ion bombardment and interfacial bonding has been discussed.

Type
Articles
Information
Journal of Materials Research , Volume 8 , Issue 8 , August 1993 , pp. 1958 - 1963
Copyright
Copyright © Materials Research Society 1993

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References

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