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Ion beam processing of LiNbO3

Published online by Cambridge University Press:  03 March 2011

B. R. Appleton ,
G. M. Beardsley ,
G. C. Farlow ,
W. H. Christie  and
P. R. Ashley
B. R. Appleton
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
G. M. Beardsley
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
G. C. Farlow
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
W. H. Christie
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
P. R. Ashley
Affiliation:
U. S. Army Missile Laboratory, Redstone, Arsenal, Alabama 35898
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Abstract

Ion implantation and ion beam mixing have been investigated as alternative techniques to hightemperature diffusion for introducing dopants into LiNbO3. Heavy ion bombardment at both 77 and 300 K initiated a near-surface decomposition causing Li to diffuse to the surface where it formed a nonuniform agglomerate. The damage and annealing characteristics of this effect were studied by ion scattering/channeling, secondary ion mass spectrometry, and optical microscopy. The origins of the surface decomposition are discussed along with possible solutions, and selected samples were evaluated for waveguide properties.

Type
Articles
Information
Journal of Materials Research , Volume 1 , Issue 1 , February 1986 , pp. 104 - 113
Copyright
Copyright © Materials Research Society 1986

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