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Growth of vertically oriented films of carbon nanotubes by activated catalytic chemical vapor deposition on Fe–Co/TiN/Si(100) substrates

Published online by Cambridge University Press:  31 January 2011

F. Le Normand ,
C.T. Fleaca ,
M. Gulas ,
A. Senger ,
O. Ersen ,
I.N. Mihailescu ,
G. Socol ,
D. Muller  and
M.C. Marco de Lucas
F. Le Normand*
Affiliation:
Groupe Surfaces and Interfaces, Institut de Physique et Chimie des Matériaux (IPCMS), UMR 7504 Centre national de la Recherche Scientifique (CNRS) et Université Louis Pasteur (ULP), 67034 Strasbourg Cedex, France
C.T. Fleaca
Affiliation:
Groupe Surfaces and Interfaces, Institut de Physique et Chimie des Matériaux (IPCMS), UMR 7504 Centre national de la Recherche Scientifique (CNRS) et Université Louis Pasteur (ULP), 67034 Strasbourg Cedex, France
M. Gulas
Affiliation:
Groupe Surfaces and Interfaces, Institut de Physique et Chimie des Matériaux (IPCMS), UMR 7504 Centre national de la Recherche Scientifique (CNRS) et Université Louis Pasteur (ULP), 67034 Strasbourg Cedex, France
A. Senger
Affiliation:
Groupe Surfaces and Interfaces, Institut de Physique et Chimie des Matériaux (IPCMS), UMR 7504 Centre national de la Recherche Scientifique (CNRS) et Université Louis Pasteur (ULP), 67034 Strasbourg Cedex, France
O. Ersen
Affiliation:
Groupe Surfaces and Interfaces, Institut de Physique et Chimie des Matériaux (IPCMS), UMR 7504 Centre national de la Recherche Scientifique (CNRS) et Université Louis Pasteur (ULP), 67034 Strasbourg Cedex, France
I.N. Mihailescu
Affiliation:
National Institute for Lasers, Plasma and Radiation Physics, 76900 Bucharest, Romania
G. Socol
Affiliation:
National Institute for Lasers, Plasma and Radiation Physics, 76900 Bucharest, Romania
D. Muller
Affiliation:
Institut d’Electronique du Solide et des Systémes (INESS), UMR 7163 Centre national de la Recherche Scientifique (CNRS) et Université Louis Pasteur (ULP), 67037 Strasbourg Cedex, France
M.C. Marco de Lucas
Affiliation:
Institut Carnot de Bourgogne, UMR 5209 Centre National de la Recherche Scientifique (CNRS)-Université de Bourgogne, F-21078 Dijon Cedex, France
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

In this paper, the growth of thin and dense films of vertically aligned carbon nanotubes (CNTs) on Fe–Co/TiN/Si(100) substrates is reported. Special attention is held to the preparation of the TiN buffer layers. This layer is deposited by pulse laser deposition at high temperature with a high texturation according to [TiN(100)//Si(100)]. Further ammonia heat treatment is performed at 623 K to control a Ti:N stoichiometry and remove oxygen impurity. Fe and Co as catalysts are subsequently deposited at high temperature (923 K) at the monolayer level with two ultrahigh vacuum evaporator cells. The growth of CNTs is performed by a direct-current plasma-enhanced and hot filaments-assisted catalytic chemical vapor deposition (dc HF CCVD) process. Highly dense films of CNTs, are obtained with only 0.5 nm Fe(Co) evaporated. Observations by transmission electron microscopy show that most of the CNTs display sizes in the 2.5–6 nm range, most of them with a double-wall (DW). This is in agreement with spectral features of the Raman radial breathing modes (RBM) in the 70–130 cm−1 range. Generally, these large-diameter DWCNTs display a high defect density with morphologies partially collapsed into flattened twisted shapes.

Keywords

CChemical vapor deposition (CVD) (deposition)Nanostructure
Type
Articles
Information
Journal of Materials Research , Volume 23 , Issue 3 , March 2008 , pp. 619 - 631
Copyright
Copyright © Materials Research Society 2008

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