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Grazing incidence synchrotron x-ray diffraction method for analyzing thin films

Published online by Cambridge University Press:  31 January 2011

G. Lim ,
W. Parrish ,
C. Ortiz ,
M. Bellotto  and
M. Hart
G. Lim
Affiliation:
IBM Almaden Research Center, San Jose, California 95120-6099
W. Parrish
Affiliation:
IBM Almaden Research Center, San Jose, California 95120-6099
C. Ortiz
Affiliation:
IBM Almaden Research Center, San Jose, California 95120-6099
M. Bellotto
Affiliation:
Universitá di Brescia, 25060 Brescia, Italy
M. Hart
Affiliation:
Department of Physics, The University, Manchester M13 9PL, United Kingdom
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Abstract

A method using synchrotron radiation parallel beam x-ray optics with a small incidence angle α on the specimen and 2Θ-detector scanning is described for depth profiling analysis of thin films. The instrumentation is the same as used for Θ:2Θ synchrotron parallel beam powder diffractometry, except that the specimen is uncoupled from the detector. There is no profile distortion. Below the critical angle for total reflection αc, the top tens of Angstroms are sampled. Depth profiling is controlled to a few Angstroms using a small α and 0.005° steps. The penetration depth increases to several hundred Angstroms as α approaches αc. Above αc there is a rapid increase in penetration depth to a thousand Angstroms or more and the profiling cannot be sensitively controlled. At grazing incidence the peaks are shifted several tenths of a degree by the x-ray refraction and an experimental procedure for calculating the shifts is described. The method is illustrated with an analysis of iron oxide films.

Type
Articles
Information
Journal of Materials Research , Volume 2 , Issue 4 , August 1987 , pp. 471 - 477
Copyright
Copyright © Materials Research Society 1987

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References

REFERENCES

1Segmuller, A. and Maukami, M., in Thin Filmsfrom Free Atoms and Particles, edited by Klabunde, K. J. (Academic, New York, 1985), p. 325.CrossRefGoogle Scholar
2Parrish, W., X-Ray Analysis Papers (Centrex, Eindhoven, The Netherlands, 1965).Google Scholar
3Parrish, W. and Mack, M., Acta Crystaliogr. 23, 687 (1967).CrossRefGoogle Scholar
4Marra, W. C., Eisenberger, P., and Cho, A. Y., J. Appl. Phys. 50, 6927 (1979).CrossRefGoogle Scholar
5Marra, W. C., Fuoss, P. H., and Eisenberger, P., Phys. Rev. Lett. 49, 1169 (1982).CrossRefGoogle Scholar
6Parrish, W. and Hart, M., Trans. Am. Crystallogr. Assoc. 21, 51 (1985).Google Scholar
7Parrish, W., Hart, M., Huang, T. C., and Bellotto, M., Adv. X-Ray Anal. 30 (to be published) 1987.Google Scholar
8Vineyard, G. H., Phys. Rev. B 26, 4146 (1982).CrossRefGoogle Scholar
9Guinier, A., X-Ray Diffraction (Freeman, San Francisco, 1963).Google Scholar
10James, R. W., Solid State Phys. 15, 53 (1963).CrossRefGoogle Scholar
11Hart, M., Parrish, W., Lim, G. S., and Bellotto, M. (in preparation).Google Scholar
12Aeschlimann, M., Bona, G. L., Meier, F., Stampanoni, M., Stampieri, G., and Siegmann, H. C., Appl. Phys. Lett. 49, 824 (1986).CrossRefGoogle Scholar