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Gas-phase coating of TiO2 with SiO2 in a continuous flow hot-wall aerosol reactor

Published online by Cambridge University Press:  31 January 2011

Quint H. Powell ,
George P. Fotou ,
Toivo T. Kodas ,
Bruce M. Anderson  and
Yongxiang Guo
Quint H. Powell
Affiliation:
Department of Chemical and Nuclear Engineering, University of New Mexico, Albuquerque, New Mexico 87131
George P. Fotou
Affiliation:
Department of Chemical and Nuclear Engineering, University of New Mexico, Albuquerque, New Mexico 87131
Toivo T. Kodas*
Affiliation:
Department of Chemical and Nuclear Engineering, University of New Mexico, Albuquerque, New Mexico 87131
Bruce M. Anderson
Affiliation:
Kemira Pigments, Inc., P.O. Box 368, Savannah, Georgia 31402
Yongxiang Guo
Affiliation:
Department of Earth and Planetary Sciences, University of New Mexico, Albuquerque, New Mexico 87131
*
a)Author to whom correspondence should be addressed.
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Abstract

The feasibility of in situ coating of titania particles with silica using a high-temperature, gas-phase process was demonstrated. Titania was produced from the reaction of TiCl4 and O2 in a hot-wall, tubular, aerosol reactor and directly coated in the gas phase via the reaction of O2 with SiCl4 vapor. Rough SiO2 coatings were obtained at 1300 °C while uniform, dense coatings were obtained at all conditions examined for 1500 °C. The presence of water in the reactor significantly influenced the morphology of the coatings and resulted in smooth, dense, and uniform coatings at 1300 °C. Coating thicknesses could be controlled from 5 nm to roughly 100 nm, corresponding to growth rates on the order of 10–100 nmys. The characteristics of the coatings depended upon the concentration of SiCl4 and the coating temperature. These process variables influenced the coating mechanism, growth rate, and densification which directly influenced the coating uniformity and thickness.

Type
Articles
Information
Journal of Materials Research , Volume 12 , Issue 2 , February 1997 , pp. 552 - 559
Copyright
Copyright © Materials Research Society 1997

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