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Fracture of nanoporous methyl silsesquioxane thin-film glasses

Published online by Cambridge University Press:  01 April 2006

Eric P. Guyer ,
Matthias Patz  and
Reinhold H. Dauskardt
Eric P. Guyer
Affiliation:
Department of Materials Science & Engineering, Stanford University, Stanford, California 94305
Matthias Patz
Affiliation:
Tsukuba Research Laboratory, JSR Corporation, Tsukuba, Ibaraki 305-0851, Japan
Reinhold H. Dauskardt*
Affiliation:
Department of Materials Science & Engineering, Stanford University, Stanford, California 94305
*
b)Address all correspondence to this author. e-mail: [email protected]
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Abstract

The fracture of nanoporous methylsilsesquioxane thin-film glasses in moist air and aqueous solutions was investigated. We demonstrate the effects of controlled volume fractions of nanometer sized pores on the films resistance to fracture. Subcritical cracking accelerated by the presence of moisture, controlled pH, and hydrogen peroxide solutions is reported. Surprising changes in the near threshold growth rate behavior were observed for buffered solutions. We demonstrate that these changes are related to the unexpected diffusion of the aqueous solutions into the highly hydrophobic films. The presence of the solution changes the surface stress of the internal pore surfaces, which changes the stress state of the film. The change in film stress surrounding the crack alters the crack driving force and has profound effects on the resulting crack-growth threshold behavior.

Keywords

FracturePorositySi
Type
Articles
Information
Journal of Materials Research , Volume 21 , Issue 4 , April 2006 , pp. 882 - 894
Copyright
Copyright © Materials Research Society 2006

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References

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