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Fatigue in hydrazone-based xerographic photoreceptors: Effect of ultraviolet irradiation

Published online by Cambridge University Press:  31 January 2011

C. K. H. Wong ,
Y. C. Chan ,
J. Pfleger ,
Y. W. Lam ,
K. M. Leung  and
D. S. Chiu
C. K. H. Wong
Affiliation:
Department of Electronic Engineering, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong
Y. C. Chan
Affiliation:
Department of Electronic Engineering, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong
J. Pfleger
Affiliation:
Department of Electronic Engineering, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong
Y. W. Lam
Affiliation:
Department of Electronic Engineering, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong
K. M. Leung
Affiliation:
Department of Physics & Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong
D. S. Chiu
Affiliation:
Department of Physics & Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong
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Abstract

The effect of ultraviolet irradiation on the xerographic sensitometry of organic photoreceptors was studied. Absorbed ultraviolet light decreased both the dark decay and the photoinduced discharge rates, and an increased buildup of the residual potential was observed. Above a threshold dose of ultraviolet irradiation, the residual potential was seen to decrease, and at the same time a slight increase of the hardness of the photoreceptor surface was detected. These behaviors originate from a decrease in the density of charge transport sites which is caused by the photochemical changes in the charge transport layer system.

Type
Articles
Information
Journal of Materials Research , Volume 12 , Issue 1 , January 1997 , pp. 106 - 112
Copyright
Copyright © Materials Research Society 1997

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References

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