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Effects of substrate bias on nanocrystal-(Ti, Al)Nx/amorphous-SiNy composite films

Published online by Cambridge University Press:  31 January 2011

Bao-Shun Yau ,
Jow-Lay Huang  and
Ming-Chi Kan
Bao-Shun Yau
Affiliation:
Department of Materials Science and Engineering, National Cheng-Kung University, Tainan 701, Taiwan, Republic of China
Jow-Lay Huang
Affiliation:
Department of Materials Science and Engineering, National Cheng-Kung University, Tainan 701, Taiwan, Republic of China
Ming-Chi Kan
Affiliation:
Department of Materials Science and Engineering, National Cheng-Kung University, Tainan 701, Taiwan, Republic of China
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Abstract

Nanocrystal-(Ti, Al)Nx/amorphous-SiNy composite films were prepared in a codeposition process under different substrate bias voltages. The effects of substrate bias voltage on the deposition rate, composition, microstructure, and mechanical properties of nanocomposite films were investigated. Results indicated that the films with bias voltages caused resputtering due to the bombardment of high-energy ions on film surface. The resputtering effect had substantial influence on deposition rate, surface morphology, and composition of films. The films with (220) preferred orientation were also observed as the applied substrate bias voltages exceeded 50 V. As the substrate bias voltage increased, the nanocrystallite size increased, lattice strain raised, and the hardness decreased.

Type
Articles
Information
Journal of Materials Research , Volume 18 , Issue 8 , August 2003 , pp. 1985 - 1990
Copyright
Copyright © Materials Research Society 2003

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