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Effects of process variables on properties and composition of a-Si:C:H films

Published online by Cambridge University Press:  31 January 2011

I. L. Moskowitz ,
W. A. Lanford  and
S. V. Babu
I. L. Moskowitz*
Affiliation:
Center for Advanced Materials Processing, Box 5705, Clarkson University, Potsdam, New York 13699
W. A. Lanford
Affiliation:
Department of Physics, State University of New York at Albany, Albany, New York 12222
S. V. Babu
Affiliation:
Center for Advanced Materials Processing, Box 5705, Clarkson University, Potsdam, New York 13699
*
a) Address all correspondence to this author. e-mail: reach [email protected]
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Abstract

Physical properties of a-Si:C:H films, including composition, optical constants, microhardness, and surface energy, were investigated. A factorial experimental design was employed to establish the effects of plasma-assisted chemical vapor deposition parameters on the physical properties of the films. The dynamics of the plasma deposition process are discussed in relation to the interactions observed among the process variables and the effects of the variables on the physical properties of the films.

Type
Articles
Information
Journal of Materials Research , Volume 18 , Issue 1 , January 2003 , pp. 129 - 138
Copyright
Copyright © Materials Research Society 2003

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