Hostname: page-component-586b7cd67f-vdxz6 Total loading time: 0 Render date: 2024-11-26T04:27:10.516Z Has data issue: false hasContentIssue false

The effects of low temperature and pressure on the fracture behaviors of organosilicate thin films

Published online by Cambridge University Press:  31 August 2011

Soheil Barakat
Affiliation:
Department of Mechanical Engineering, University of Waterloo, Waterloo, Ontario N2L 3G1, CANADA
Pearl Lee-Sullivan
Affiliation:
Department of Mechanical Engineering, University of Waterloo, Waterloo, Ontario N2L 3G1, CANADA
Steven A. Vitale
Affiliation:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02420-9108
Ting Y. Tsui*
Affiliation:
Department of Chemical Engineering, University of Waterloo, Waterloo, Ontario N2L 3G1, CANADA
*
a)Address all correspondence to this author. e-mail: [email protected]
Get access

Abstract

A novel load–displacement sensing instrument has been designed and fabricated to characterize the fracture properties of brittle thin films at low temperature (approximately −30 °C) and pressure (1.6e-4 Pa) environments. In this study, the instrument was used to investigate the effects of harsh environments on the fracture behaviors of organosilicate glass (OSG) and silicon carbonitride (SiCN) thin films under four-point bend loading. Experimental results showed that the fracture strengths of film stacks are the highest when the environment contains a very low water molecule concentration. This condition can be achieved by purging the testing chamber with pure nitrogen or reducing the chamber pressure to less than 1 Pa. In contrast, cracks propagated readily along OSG/SiCN interfaces when experiments were performed in deionized water. The effects of low temperature (approximately −30 °C) and pressure on thin film fracture were also studied, and the results demonstrated that there is no observed degradation of the OSG fracture properties. X-ray photoelectron spectroscopy (XPS) technique was used to identify the chemical composition of the fracture surfaces.

Type
Articles
Copyright
Copyright © Materials Research Society 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.O’Neill, M.L., Haas, M.K., Peterson, B.K., Vrtis, R.N., Weigel, S.J., Wu, D., Bitner, M.D., and Karwacki, E.J.: Impact of pore size and morphology of porous organosilicate glasses on integrated circuit manufacturing, in Technology and Reliability of Low-k Dielectrics and Copper Interconnects, edited by Tsui, T.Y., Joo, Y.C., Michaelson, L., Lane, M., and Volinsky, A.A. (Mater. Res. Soc. Symp. Proc., Vol. 914, Materials Research Society, Warrendale, PA, 2006), pp. 314.Google Scholar
2.Maex, K., Baklanov, M.R., Shamiryan, D., Iacopi, F., Brongersma, S.H., and Yanovitskaya, Z.S.: Low-dielectric constant materials for microelectronics. J. Appl. Phys. 93, 8793 (2003).CrossRefGoogle Scholar
3.Morgen, M., Ryan, E.T., Zhao, J.H., Hu, C., Cho, T., and Ho, P.S.: Low-dielectric constant materials for ULSI interconnects. Annu. Rev. Mater. Sci. 30, 645 (2000).CrossRefGoogle Scholar
4.Liniger, E.G. and Cook, R.F.: A controlled flaw technique for lifetime characterization. J. Am. Ceram. Soc. 76, 2123 (1993).CrossRefGoogle Scholar
5.Lawn, B.R.: Diffusion-controlled subcritical crack growth in the presence of a dilute gas environment. Mater. Sci. Eng. 13, 277 (1974).CrossRefGoogle Scholar
6.Wiederhorn, S.M.: Influence of water vapor on crack propagation in soda-lime glass. J. Am. Ceram. Soc. 50, 407 (1967).CrossRefGoogle Scholar
7.Wiederhorn, S.M. and Bolz, L.H.: Stress corrosion and static fatigue of glass. J. Am. Ceram. Soc. 53, 543 (1970).CrossRefGoogle Scholar
8.Wiederhorn, S.M. and Johnson, H.: Effect of electrolyte pH on crack propagation in glass. J. Am. Ceram. Soc. 56, 192 (1973).Google Scholar
9.Wiederhorn, S.M., Fuller, E.R., and Thomson, R.: Micromechanisms of crack growth in ceramics and glasses in corrosive environments. J. Ment. Sci. 14, 450 (1980).Google Scholar
10.Lawn, B.R.: An atomistic model of kinetic crack growth. J. Mater. Sci. 10, 469 (1975).Google Scholar
11.Cook, R.F. and Liniger, E.G.: Stress-corrosion cracking of low-dielectric constant spin-on-glass thin films. J. Electromech. Soc. 146, 4439 (1999).CrossRefGoogle Scholar
12.Kook, S.Y. and Dauskardt, R.H.: Moisture-assisted subcritical debonding of a polymer/metal interface. J. Appl. Phys. 91, 1293 (2002).Google Scholar
13.Lane, M., Dauskardt, R., Ma, Q., Fujimoto, H., and Krishna, N.: Subcritical debonding of multilayer interconnect structures: Temperature and humidity effects, in Materials Realibility in Microelectronics IX, edited by Volkert, C.A., Verbruggen, A.H., and Brown, D.D. (Mater. Res. Soc. Symp. Proc., Vol. 563, Warrendale, PA, 1999), pp. 251256.Google Scholar
14.Lane, M.W., Snodgrass, J.M., and Dauskardt, R.H.: Environmental effects on interfacial adhesion. Microelectron. Reliab. 41, 1615 (2001).Google Scholar
15.Hutchinson, J.W. and Suo, Z.: Mixed mode cracking in layered materials. Adv. Appl. Mech. 29, 63 (1992).Google Scholar
16.Liu, X.H., Suo, Z., Ma, Q., and Fujimoto, H.: Developing design rules to avert cracking and debonding in integrated circuit structures. Eng. Fract. Mech. 66, 387 (2000).Google Scholar
17.Ambrico, J.M., Jones, E.E., and Begley, M.R.: Cracking in thin multi-layers with finite-width and periodic architectures. Int. J. Solids Struct. 39, 1443 (2002).Google Scholar
18.Liu, X.H., Shaw, T.M., Lane, M.W., Rosenberg, R.R., Lane, S.L., Doyle, J.P., Restaino, D., Vogt, S.F., and Edelstein, D.C.: Channel cracking in low-k films on patterned multi-layers, in Interconnect Technology Conference, June 7–9, 2004, Proceedings of the IEEE 2004 International, pp. 9395 (2004).Google Scholar
19.Vlassak, J.J.: Channel cracking in thin films on substrates of finite thickness. Int. J. Fract. 119, 299 (2003).CrossRefGoogle Scholar
20.Vlassak, J.J., Lin, Y., and Tsui, T.Y.: Fracture of organosilicate glass thin films: Environmental effects. Mater. Sci. Eng., A 391, 159 (2005).CrossRefGoogle Scholar
21.Guyer, E.P., Patz, M., and Dauskardt, R.H.: Fracture of nanoporous methyl silsesquioxane thin-film glasses. J. Mater. Res. 21, 882 (2006).CrossRefGoogle Scholar
22.Lin, Y., Tsui, T.Y., and Vlassak, J.J.: Water diffusion and fracture in organosilicate glass film stacks. Acta Mater. 55, 2455 (2007).CrossRefGoogle Scholar
23.Li, H., Lin, Y., Tsui, T.Y., and Vlassak, J.J.: The effect of porogen loading on the stiffness and fracture energy of brittle organosilicates. J. Mater. Res. 24, 107 (2009).CrossRefGoogle Scholar
24.Lin, Y., Xiang, Y., Tsui, T.Y., and Vlassak, J.J.: PECVD low-permittivity organosilicate glass coatings: Adhesion, fracture, and mechanical properties. Acta Mater. 56, 4932 (2008).Google Scholar
25.Maidenberg, D.A., Volksen, W., Miller, R.D., and Dauskardt, R.H.: Toughening of nanoporous glasses using porogen residuals. Nat. Mater. 3, 464 (2004).CrossRefGoogle ScholarPubMed
26.Iacopi, F., Tavaly, Y., Eyckens, B., Waldfried, C., Abell, T., Guyer, E.P., Gage, D.M., Dauskardt, R.H., Sajavaara, T., Houthoofd, K., Grobet, P., Jacobs, P., and Maex, K.: Short-ranged structural rearrangement and enhancement of mechanical properties of organosilicate glasses induced by ultraviolet radiation. J. Appl. Phys. 99, 053511 (2006).CrossRefGoogle Scholar
27.Smith, R.S., Tsui, T.Y., and Ho, P.S.: Effects of ultraviolet radiation on ultra-low-dielectric constant thin film fracture properties. J. Mater. Res. 24(9), 2795 (2008).CrossRefGoogle Scholar
28.Merrill, C.C. and Ho, P.S.: Effect of mode-mixity and porosity on interfacial fracture of low-k dielectrics, in Technology and Reliability for Advanced Interconnects and Low-k Dielectrics, edited by Carter, R.J., HauRiege, C.S., Lu, T.M., and Schulz, S.E. (Mater. Res. Soc. Symp. Proc., Vol. 812, Warrendale, PA, 2004), pp. 6166.Google Scholar
29.Tsui, T.Y., McKerrow, A.J., and Vlassak, J.J.: The effect of water diffusion on the adhesion of organosilicate glass film stacks. J. Mech. Phys. Solids 54, 887 (2006).CrossRefGoogle Scholar
30.Guyer, E.P. and Dauskardt, R.H.: Effects of solution pH on the accelerated cracking of nanoporous thin-film glasses. J. Mater. Res. 20, 680 (2005).CrossRefGoogle Scholar
31.Lin, Y., Vlassak, J.J., Tsui, T.Y., and McKerrow, A.J.: Environmental effects on subcritical delamination of dielectric and metal films from organosilicate glass (OSG) thin films, in Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics, edited by McKerrow, A.J., Leu, J., and Kraft, O. (Mater. Res. Soc. Symp. Proc., Vol. 766, Warrendale, PA, 2003), pp. 171176.Google Scholar
32.Matos, P.P.L., McMeeking, R.M., Charalambides, P.G., and Drory, M.D.: A method for calculating stress intensities in bimaterial fracture. Int. J. Fract. 40, 235 (1989).CrossRefGoogle Scholar
33.Charalambides, P.G., Cao, H.C., Lund, J., and Evans, A.G.: Development of a test method for measuring the mixed-mode fracture resistance of bimaterial interfaces. Mech. Mater. 8, 269 (1990).Google Scholar
34.Ma, Q., Fujimoto, H., Flinn, P., Jain, V., Adibi-Rizi, F., Moghadam, F., and Dauskardt, R.H.: Quantitative measurement of interface fracture energy in multi-layer thin film structures, in Materials Reliability in Microelectronics V, edited by Filter, W.F., Gadepally, K., Greer, A.L., Oates, A.S., and Rosenberg, R. (Mater. Res. Soc. Symp. Proc., Vol. 391, Warrendale, PA, 1995), pp. 9196.Google Scholar
35.Ma, Q.: A four-point bending technique for studying subcritical crack growth in thin films and at interfaces. J. Mater. Res. 12, 840 (1997).CrossRefGoogle Scholar
36.Steinherz, H.: Handbook of High Vacuum Engineering (Reinhold Publishing Corp., New York, 1963).Google Scholar