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Diffraction studies of cubic phase stability in undoped zirconia thin films

Published online by Cambridge University Press:  31 January 2011

S. C. Moulzolf  and
R. J. Lad
S. C. Moulzolf
Affiliation:
Laboratory for Surface Science and Technology, Department of Physics and Astronomy, University of Maine, Orono, Maine 04469-5764
R. J. Lad
Affiliation:
Laboratory for Surface Science and Technology, Department of Physics and Astronomy, University of Maine, Orono, Maine 04469-5764
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Abstract

Pure stoichiometric ZrO2 films were deposited on amorphous silica substrates by electron beam evaporation of Zr in the presence of an electron cyclotron resonance oxygen plasma. Grain size, strain, and texture were analyzed by x-ray diffraction and reflection high-energy electron diffraction. Films grown at room temperature are polycrystalline and exist in the cubic phase. Growth at elevated temperatures produces coexisting cubic and monoclinic phases and shows a maximum critical grain size of ??~10 nm for stabilization of the cubic phase. Pole figure analysis indicates a preferred cubic [200] fiber axis for room-temperature growth and dual monoclinic {111} and in-plane textures for films grown at 400 °C. Postdeposition annealing experiments confirm the existence of a critical grain size and suggest mechanisms for grain growth.

Type
Articles
Information
Journal of Materials Research , Volume 15 , Issue 2 , February 2000 , pp. 369 - 376
Copyright
Copyright © Materials Research Society 2000

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