Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by Crossref.
Robertson, John
1991.
Hard amorphous (diamond-like) carbons.
Progress in Solid State Chemistry,
Vol. 21,
Issue. 4,
p.
199.
Lin, S.
and
Feldman, Bernard J.
1992.
Electron Collisions in the Plasma as a Major Factor in the Growth of Amorphous Hydrogenated Carbon.
MRS Proceedings,
Vol. 270,
Issue. ,
Dunlop, E.
Haupt, J.
Schmidt, K.
and
Gissler, W.
1992.
Hardness and Young's modulus of diamond-like carbon films prepared by ion beam methods.
Diamond and Related Materials,
Vol. 1,
Issue. 5-6,
p.
644.
Sinha, K.
Menéndez, J.
Sankey, O. F.
Johnson, D. A.
Varhue, W. J.
Kidder, J. N.
Pastel, P. W.
and
Lanford, W.
1992.
Raman scattering and the π-orbitals in amorphous carbon films.
Applied Physics Letters,
Vol. 60,
Issue. 5,
p.
562.
Mendez, Juan Manuel
Muhl, Stephen
Contreras-Puente, G.
and
Aguilar-Hernandez, J.
1992.
Optical properties of amorphous carbon thin films prepared by plasma deposition in a graphite hollow cathode.
Thin Solid Films,
Vol. 220,
Issue. 1-2,
p.
125.
Robertson, J.
1992.
Properties of diamond-like carbon.
Surface and Coatings Technology,
Vol. 50,
Issue. 3,
p.
185.
Liebler, V.
Baumann, H.
and
Bethge, K.
1993.
Characterization of ion-beam-deposited diamond-like carbon films.
Diamond and Related Materials,
Vol. 2,
Issue. 2-4,
p.
584.
Batanov, G M
Berezhetskaya, N K
Bol'shakov, E F
Gorbunov, A A
Dorofeyuk, A A
Konov, V I
Kope'ev, V A
Kossyi, I A
and
Kostinskii, A Yu
1993.
Plasma chemistry and thin film deposition in discharges excited by intense microwave beams.
Plasma Sources Science and Technology,
Vol. 2,
Issue. 3,
p.
164.
Revelle, David
Mulestagno, L.
Lin, S.
and
Feldman, Bernard J.
1993.
The role of hydrogen in the growth of amorphous hydrogenated carbon.
Solid State Communications,
Vol. 86,
Issue. 4,
p.
235.
Delaunay, M.
and
Touchais, E.
1998.
Electron cyclotron resonance plasma ion source for material depositions.
Review of Scientific Instruments,
Vol. 69,
Issue. 6,
p.
2320.
Kang, Dae-Hwan
Ha, Seung-Chul
Kim, Ki-Bum
and
Min, Seok-Hong
1998.
Evaluation of the ion bombardment energy for growing diamondlike carbon films in an electron cyclotron resonance plasma enhanced chemical vapor deposition.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,
Vol. 16,
Issue. 4,
p.
2625.
Kinoshita, Haruhisa
Nomura, Shyuji
and
Honda, Masahiro
2000.
Thickness distribution of large-area diamondlike carbon films formed by CH4/H2 supermagnetron plasma chemical vapor deposition with application of a stationary magnetic field.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,
Vol. 18,
Issue. 2,
p.
367.
Ryu, Ho J.
Kim, Sung H.
and
Hong, Soon H.
2000.
Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition.
Materials Science and Engineering: A,
Vol. 277,
Issue. 1-2,
p.
57.