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Dependence of the mechanical and structural properties of (Ti,Al)N films on the nitrogen content

Published online by Cambridge University Press:  31 January 2011

C. Jiménez ,
C. Sánchez-Fernández ,
C. Morant ,
J. M. Martínez-Duart ,
M. Fernández  and
J. Sánchez-Olías
C. Jiménez
Affiliation:
Dpto. Física Aplicada C-12, Universidad Autónoma de Madrid, Cantoblanco 28049, Madrid, Spain
C. Sánchez-Fernández
Affiliation:
Dpto. Física Aplicada C-12, Universidad Autónoma de Madrid, Cantoblanco 28049, Madrid, Spain
C. Morant
Affiliation:
Dpto. Física Aplicada C-12, Universidad Autónoma de Madrid, Cantoblanco 28049, Madrid, Spain
J. M. Martínez-Duart
Affiliation:
Dpto. Física Aplicada C-12, Universidad Autónoma de Madrid, Cantoblanco 28049, Madrid, Spain
M. Fernández
Affiliation:
Inst. Ciencia de Materiales, CSIC, Cantoblanco 28049, Madrid, Spain
J. Sánchez-Olías
Affiliation:
Dpto. Corrosión y Protección, Centro Nacional de Investigación Metalúrgicas, CSIC, Avda. Gregorio del Amo, 8.28040, Madrid, Spain
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Abstract

(Ti,Al)N films with increasing nitrogen content were grown by reactive cosputtering and characterized by auger electron spectroscopy, grazing x-ray diffraction, polarization curves, electrochemical impedance spectroscopy, nanoindentation, and atomic force microscopy. For Ti/Al ≈ 1 the Ti1−x AlxN phase is always present, but lower nitrogen contents lead to an additional phase, probably α–Ti(Al), which causes a decrease in hardness and Young's modulus. The increase of nitrogen content results ina decrease of surface roughness or a more compacted surface coating, according to the impedance results.

Type
Articles
Information
Journal of Materials Research , Volume 14 , Issue 7 , July 1999 , pp. 2830 - 2837
Copyright
Copyright © Materials Research Society 1999

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