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Crystallization and sintering characteristics of chemically vapor deposited silicon nitride powders

Published online by Cambridge University Press:  31 January 2011

C. Gomez-Aleixandre ,
J.M. Albella ,
J.M. Martínez-Duart  and
F. Orgaz
C. Gomez-Aleixandre
Affiliation:
Departamento de Física Aplicada, UAM, and Instituto de Ciencia de Materiales, CSIC, Cantoblanco, 28049 Madrid, Spain
J.M. Albella
Affiliation:
Departamento de Física Aplicada, UAM, and Instituto de Ciencia de Materiales, CSIC, Cantoblanco, 28049 Madrid, Spain
J.M. Martínez-Duart
Affiliation:
Departamento de Física Aplicada, UAM, and Instituto de Ciencia de Materiales, CSIC, Cantoblanco, 28049 Madrid, Spain
F. Orgaz
Affiliation:
Centro de Investigación de ERCROS, S.A., Ronda de Valdecarrizo, 23. Tres Cantos, 28760 Madrid, Spain
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Abstract

High purity silicon nitride powders have been obtained by Chemical Vapor Deposition (CVD), through the reaction of SiH4 and NH3 gas mixtures at 1000 °C in a quartz reactor. The crystallization characteristics of the powder have been followed by infrared and x-ray diffraction analysis. The material shows a transition from amorphous to the α-phase after a thermal treatment at about 1300 °C for 1 h, while the β-phase starts to appear at 1725 °C. The sintering properties of the amorphous and crystalline phases were evaluated by measuring the dilatometric curves of compacted powders.

Type
Articles
Information
Journal of Materials Research , Volume 7 , Issue 10 , October 1992 , pp. 2864 - 2868
Copyright
Copyright © Materials Research Society 1992

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References

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