Hostname: page-component-586b7cd67f-2plfb Total loading time: 0 Render date: 2024-11-26T23:44:25.087Z Has data issue: false hasContentIssue false
  • English
  • Français

Contribution of electrolysis current to growth of SrTiO3 thin film by the hydrothermal-electrochemical method

Published online by Cambridge University Press:  03 March 2011

Koji Kajiyoshi ,
Kunisaburo Tomono ,
Yukio Hamaji ,
Toru Kasanami  and
Masahiro Yoshimura
Koji Kajiyoshi*
Affiliation:
Ceramic Research and Development Department, Murata Manufacturing Co., Ltd., 2–26–10, Tenjin, Nagaokakyo, Kyoto 617, Japan
Kunisaburo Tomono
Affiliation:
Ceramic Research and Development Department, Murata Manufacturing Co., Ltd., 2–26–10, Tenjin, Nagaokakyo, Kyoto 617, Japan
Yukio Hamaji
Affiliation:
Ceramic Research and Development Department, Murata Manufacturing Co., Ltd., 2–26–10, Tenjin, Nagaokakyo, Kyoto 617, Japan
Toru Kasanami
Affiliation:
Ceramic Research and Development Department, Murata Manufacturing Co., Ltd., 2–26–10, Tenjin, Nagaokakyo, Kyoto 617, Japan
Masahiro Yoshimura
Affiliation:
Research Laboratory of Engineering Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 227, Japan
*
a)Author to whom correspondence should be addressed.
Get access

Abstract

The electrolysis treatment of the hydrothermal-electrochemical method has been modified so that it permits SrTiO3 thin films to be grown on Ti electrodes being oxidized anodically in Sr(OH)2 solutions far beyond a thickness limit of several tens of nanometers hitherto attained. The relation between the total current passed through the Ti anode and the amount of the resulting SrTiO3 film was analyzed on the basis of a reaction model that interprets the anodic current to be compensated with electrons generated partly by oxidation of Ti and partly by decomposition of H2O. Current efficiency for the film growth was estimated to be in the range from 0.8 to 3% depending on the Ti electrode potential.

Type
Articles
Information
Journal of Materials Research , Volume 9 , Issue 8 , August 1994 , pp. 2109 - 2117
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Yoo, S. E., Ishizawa, N., Hayashi, M., and Yoshimura, M., Report of The Research Laboratory of Engineering Materials of Tokyo Institute Technology, No. 16 (1991), p. 39.Google Scholar
2Yoshimura, M., Yoo, S. E., Hayashi, M., and Ishizawa, N., Jpn. J. Appl. Phys. 28, L2007 (1989).CrossRefGoogle Scholar
3Yoshimura, M., Yoo, S. E., Hayashi, M., and Ishizawa, N., in Ceramic Transactions, Vol. 15, Microelectronic Systems, edited by Nair, K. M., Pohanka, R., and Buchanan, R. C. (The American Ceramic Society, Westerville, OH, 1990), pp. 427–436.Google Scholar
4Ishizawa, N., Yoo, S. E., Hayashi, M., and Yoshimura, M., in Ferroelectric Thin Films, edited by Myers, E. R. and Kingon, A. I. (Mater. Res. Soc. Symp. Proc. 200, Pittsburgh, PA, 1990), pp. 57–62.Google Scholar
5Yoo, S. E., Hayashi, M., Ishizawa, N., and Yoshimura, M., J. Am. Ceram. Soc. 73, 2561 (1990).CrossRefGoogle Scholar
6Sakabe, Y., Hamaji, Y., Hayashi, M., Ogino, Y., Ishizawa, N., and Yoshimura, M., in Proceedings of The Fifth U.S. -Japan Seminar on Dielectric and Piezoelectric Ceramics, Kyoto, Japan (1990), pp. 300–303.Google Scholar
7Tachibana, K., Boshoku Gijutsu 34, 125 (1985).Google Scholar
8Macdonald, D. D., Scott, A. C., and Wentrcek, P., J. Electrochem. Soc. 126, 908 (1979).CrossRefGoogle Scholar
9Macdonald, D. D., Scott, A. C., and Wentrcek, P., J. Electrochem. Soc. 126, 1618 (1979).CrossRefGoogle Scholar
10Greeley, R. S., Smith, W. T. Jr., Stoughton, R. W., and Lietzke, M. H., J. Phys. Chem. 64, 652 (1960).CrossRefGoogle Scholar
11Greeley, R. S., Smith, W. T. Jr., Lietzke, M. H., and Stoughton, R. W., J. Phys. Chem. 64, 1445 (1960).CrossRefGoogle Scholar
12Sugimoto, K. and Soma, S., Boshoku Gijutsu 31, 574 (1982).Google Scholar
13Briggs, D. and Riviére, J. C., in Practical Surface Analysis, Vol. 1, Auger and X-ray Photoelectron Spectroscopy, edited by Briggs, D. and Seah, M. P., 2nd ed. (John Wiley ' Sons, Sussex, England, 1983), Chap. 3, pp. 85–141.Google Scholar
14Powder Diffraction File, No. 35-734 (Joint Committee on Powder Diffraction Standards, International Center for Diffraction Data, Swarthmore, PA, 1985).Google Scholar
15Drys, M. and Trzebiatowski, W., in Phase Diagrams for Ceramists, edited by Levin, E. M., Robbins, C. R., and McMurdie, H.F. (The American Ceramic Society, Westerville, OH, 1964), Vol. I, Fig. 297.Google Scholar
16Cocco, A. and Massazza, F., in Phase Diagrams for Ceramists, edited by Levin, E. M., Robbins, C. R., and McMurdie, H. F. (The American Ceramic Society, Westerville, OH, 1969), Vol. 1969 Supplement, Fig. 2334.Google Scholar
17Kajiyoshi, K., Tomono, K., Hamaji, Y., Kasanami, T., and Yoshimura, M., unpublished.Google Scholar
18Bard, A. J. and Faulkner, L. R., Electrochemical Methods — Fundamentals and Applications (John Wiley ' Sons, New York, 1980), pp. 699–700.Google Scholar
19CRC Handbook of Chemistry and Physics, edited by Weast, R. C., 70th ed. (CRC Press, Boca Raton, FL, 1989), pp. D-274–275.Google Scholar