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A computational study of SrTiO3 thin film deposition: Morphology and growth modes

Published online by Cambridge University Press:  31 January 2011

Jennifer L. Wohlwend ,
Cosima N. Boswell ,
Simon R. Phillpot  and
Susan B. Sinnott
Cosima N. Boswell*
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611
Susan B. Sinnott*
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611
*
a) Current address: University of California Berkeley, Berkeley, California 94720.
b) Address all correspondence to this author. e-mail: [email protected]
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Abstract

The growth of SrTiO3 (STO) thin films is examined using classical molecular dynamics simulations. First, a beam of alternating SrO and TiO2 molecules is deposited on the (001) surface of STO with incident kinetic energies of 0.1, 0.5, or 1.0 eV/atom. Second, deposition of alternating SrO and TiO2 monolayers, where both have incident energies of 1.0 eV/atom, is examined. The resulting thin film morphologies predicted by the simulations are compared to available experimental data. The simulations indicate the way in which the incident energy, surface termination, and beam composition influence the morphology of the thin films. On the whole, some layer-by-layer growth is predicted to occur on both SrO- and TiO2-terminated STO for both types of deposition processes, with the alternating monolayer approach yielding thin films with compositions that are much closer to that of bulk STO.

Keywords

MorphologySimulationThin film
Type
Articles
Information
Journal of Materials Research , Volume 24 , Issue 6 , June 2009 , pp. 1994 - 2000
Copyright
Copyright © Materials Research Society 2009

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