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A comparative study of the electrical properties and microstructure of polycrystalline YBaCuO and thallium-based thin films

Published online by Cambridge University Press:  31 January 2011

C.R.M. Grovenor ,
L.T. Romano ,
K.P. Mingard ,
H-C. Lai  and
K.D. Vernon-Parry
C.R.M. Grovenor
Affiliation:
Department of Materials, University of Oxford, Parks Road, OX1 3PH, United Kingdom
L.T. Romano
Affiliation:
Department of Materials, University of Oxford, Parks Road, OX1 3PH, United Kingdom
K.P. Mingard
Affiliation:
Department of Materials, University of Oxford, Parks Road, OX1 3PH, United Kingdom
H-C. Lai
Affiliation:
Department of Materials, University of Oxford, Parks Road, OX1 3PH, United Kingdom
K.D. Vernon-Parry
Affiliation:
Department of Materials, University of Oxford, Parks Road, OX1 3PH, United Kingdom
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Abstract

Thin films of YBCO and thallium-based superconductor compounds have been deposited with very similar polycrystalline structures. The critical current densities carried by the YBCO films are much lower than measured in the thallium films (>103, as opposed to >104 A/cm2). Grain boundaries in these films have been studied to correlate microstructure with the measured electrical properties. High defect densities and frequent microcracking have been observed at and around the boundaries in the YBCO films, but these defects are not seen in the thallium-based films. We suppose that this difference is because of the higher differential thermal expansion stresses set up in YBCO during cooling. Our observations imply that eventual application of polycrystalline superconducting films prepared by an ex situ process is more likely for the thallium-based materials than for YBCO.

Type
Articles
Information
Journal of Materials Research , Volume 6 , Issue 7 , July 1991 , pp. 1408 - 1414
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

1.Dimos, D., Chaudhari, P., and Mannhart, J., Phys. Rev. B 41, 4038–4049 (1990).CrossRefGoogle Scholar
2.Dimos, D., Chaudhari, P., Mannhart, J., and LeGoues, F. K., Phys. Rev. Lett. 61, 219–222 (1988).CrossRefGoogle Scholar
3.Mannhart, J., Chaudhari, P., Dimos, D., Tsuei, C.C., and McGuire, T.R., Phys. Rev. Lett. 61, 2476–2479 (1988).CrossRefGoogle Scholar
4.Chaudhari, P., Mannhart, J., Dimos, D., Tsuei, C. C., Chi, J., Oprysko, M. M., and Scheuermann, M., Phys. Rev. Lettxs. 60, 1653–1656 (1988).Google Scholar
5.Mogro-Campero, A., Turner, L. G., and Hall, E. L., J. Appl. Phys. 65, 4951–4954 (1989).CrossRefGoogle Scholar
6.Chan, S-W., Hwang, D. M., Ramesh, R., Sampere, S. M., Nazar, L., Gerhardt, R., and Pruna, P., in High Tc Superconducting Thin Films: Processing, Characterization and Applications, edited by Stockbaur, R. (AIP Conf. No. 200, AIP, New York, 1990), p. 172.Google Scholar
7.Zandbergen, H. W., Gronsky, R., Chu, M. Y., DeJonghe, L. C., Holland, G. F., and Stacey, A., Physica C 166, 255–260 (1990).Google Scholar
8.Babcock, S. E., Cai, X. Y., Kaiser, L., and Larbalestier, D. C., Nature 347, 167–169 (1990).Google Scholar
9.Kupfer, H., Green, S.M., Jiang, C., Mei, Y., Luo, H.L., Meier-Hirmer, R., and Politis, C., Z. Phys. B 71, 63–67 (1988).Google Scholar
10.Thompson, J.R., Brynestad, J., Kroeger, D.M., Kim, Y.C., Sekula, S.T., Christen, D. K., and Specht, E. D., Phys. Rev. B 39, 6652–6659 (1989).CrossRefGoogle Scholar
11.Baumann, Th. (private communication, May 1990).Google Scholar
12.Hong, M., Liou, S.H., Bacon, D.D., Grader, G.S., Kwo, J., Kortan, A.R., and Davidson, B. A., Appl. Phys. Lett. 53, 2102–2104 (1988).CrossRefGoogle Scholar
13.Ichikawa, Y., Adachi, H., Setsune, K., Hatta, S., Hirochi, K., and Wasa, K., Appl. Phys. Lett. 53, 919–921 (1988).CrossRefGoogle Scholar
14.Kwak, J. F., Venturini, E. L., Baughman, R. J., Morosin, B., and Ginley, D. S., Cryogenics 29 3A, 291–295 (1989).CrossRefGoogle Scholar
15.Ginley, D.S., Kwak, J.F., Hellmer, R.P., Baughman, R.J., Venturini, E.L., Mitchell, M. A., and Morosin, B., Physica C 156, 592–598 (1988).Google Scholar
16.Lee, W.Y., Lee, V.Y., Salem, J., Huang, T.C., Savoy, R., Bullock, D.C., and Parkin, S. S. P., Appl. Phys. Lett. 53, 329–331 (1988).Google Scholar
17.Koch, R.H., Gallagher, W.J., Bumble, B., and Lee, W.Y., Appl. Phys. Lett. 54, 951–953 (1989).Google Scholar
18.Foglietti, V., Koch, R.H., Gallagher, W. J., Oh, B., Bumble, B., and Lee, W.Y., Appl. Phys. Lett. 54, 2259–2261 (1989).CrossRefGoogle Scholar
19.Wiesmann, H., Huai Chen, D., Sabatini, R. L., Hurst, J., Ochab, J., and Ruckman, M.W., J. Appl. Phys. 65, 1645–1647 (1989).CrossRefGoogle Scholar
20.Tietz, L.A., Carter, C.B., Lathrop, D.K., Russek, S.E., Buhrman, R.A., and Michael, J. R., J. Mater. Res. 4, 1072–1081 (1989).Google Scholar
21.Gallagher, P.K., O'Bryan, H.M., Sunshine, S.A., and Murphy, D.W., Mater. Res. Bull. XXII, 995 (1987).Google Scholar
22.Horn, P.M., Keane, D.T., Held, G.A., Jordan-Sweet, J.L., Kaiser, D.L., and Holtzberg, F., Phys. Rev. Lett. 59, 2772–2773 (1987).Google Scholar
23.Jorgensen, J.D., Beno, M.A., Hinks, D.G., Soderholm, L., Volin, K.J., Hitterman, R. L., Grace, J. D., Schuller, I. K., Segre, C. U., Zhang, K., and Kleefisch, M. S., Phys. Rev. B 36, 3608–3616 (1987).CrossRefGoogle Scholar
24.Skelton, E.F., Wlam, W.T., Osofsky, M.S., Lubitz, P., Harford, M.Z., and Singh, A. K., Phys. Rev. B 39, 2779–2780 (1989).CrossRefGoogle Scholar
25.Norton, D. P., Lowndes, D. H., Budai, J. D., Christen, D. K., Jones, E. C., McCamy, J.W., Ketcham, T.D., Julien, D. St., Lay, K.W., and Tkaczyk, J. E., J. Appl. Phys. 68, 223 (1990).Google Scholar
26.Yom, S.S., Hahn, T.S., Kim, Y.H., Chu, H., and Chai, S.S., Appl. Phys. Lett. 54, 2370–2372 (1989).Google Scholar
27.Clarke, D. R., Shaw, T. M., and Dimos, D., J. Am. Ceram. Soc. 72, 1103–1113 (1989).Google Scholar
28.Shin, D. H., Silcox, J., Russek, S. E., Lathrop, D. K., Moeckly, B., and Buhrman, R.A., Appl. Phys. Lett. 57, 508–511 (1990).Google Scholar
29.Staines, M. P. and Flower, N. E., Superconductor Sci. Technol. 4, 5232–5234 (1991).Google Scholar
30.Mingard, K. P., Romano, L. T., Grovenor, C. R. M., and Cantor, B., paper presented to Conference on Science and Technology of Thin Film Superconductors, Denver, April 1990; to be published by Plenum Press.Google Scholar