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Chemical stability of CVD source materials for high-Tc superconducting films

Published online by Cambridge University Press:  31 January 2011

Takuya Hashimoto
Affiliation:
Research Laboratory of Engineering Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 227, Japan
Hideomi Koinuma
Affiliation:
Research Laboratory of Engineering Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 227, Japan
Masaaki Nakabayashi
Affiliation:
Department of Communications, Faculty of Engineering, Tokai University, 1117 Kitakaname, Hiratsuka 259-12, Japan
Tadashi Shiraishi
Affiliation:
Department of Communications, Faculty of Engineering, Tokai University, 1117 Kitakaname, Hiratsuka 259-12, Japan
Youichi Suemune
Affiliation:
Nihon Kagaku Sangyo Co. Ltd., 80 Nakane-cho, Souka 340, Japan
Takakazu Yamamoto
Affiliation:
Research Laboratory of Resources Utilization, Tokyo Institute of Technology, 4259 Midori-ku, Nagatsuta, Yokohama 227, Japan
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Abstract

The stability of chemical vapor deposition (CVD) source materials for high-Tc superconducting films was examined by 1H-NMR (nuclear magnetic resonance), 13C-NMR, IR (infrared) absorption, and TG-DTA (thermogravimetry and differential thermal analysis) measurements. Highly purified Ca(DPM)2 (DPM: dipyvaloylmethane: (CH3)3CCOCHCOC(CH3)3) and Sr(DPM)2, utilizing recrystallization and sublimation, easily decomposed at room temperature and changed their thermal properties when they were handled and stored in air or even in an Ar atmosphere without removing adsorbed species such as water. The stability increased by removing a trace of adsorbed species and storing in an Ar atmosphere at −30 °C. Bi(C6H5)3 and Y(DPM)3 showed higher chemical stability than Ca(DPM)2 and Sr(DPM)2.

Type
Articles
Copyright
Copyright © Materials Research Society 1992

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