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Characterization of thin films containing zirconium, oxygen, and sulfur by scanning electron and atomic force microscopy

Published online by Cambridge University Press:  31 January 2011

A. Fischer ,
F. C. Jentoft ,
G. Weinberg ,
R. Schlögl ,
T. P. Niesen ,
J. Bill ,
F. Aldinger ,
M. R. De Guire  and
M. Rühle
A. Fischer
Affiliation:
Fritz-Haber-Institut der Max-Planck-Gesellschaft, Abteilung Anorganische Chemie, Faradayweg 4–6, 14195 Berlin (Dahlem), Germany
F. C. Jentoft
Affiliation:
Fritz-Haber-Institut der Max-Planck-Gesellschaft, Abteilung Anorganische Chemie, Faradayweg 4–6, 14195 Berlin (Dahlem), Germany
G. Weinberg
Affiliation:
Fritz-Haber-Institut der Max-Planck-Gesellschaft, Abteilung Anorganische Chemie, Faradayweg 4–6, 14195 Berlin (Dahlem), Germany
R. Schlögl
Affiliation:
Fritz-Haber-Institut der Max-Planck-Gesellschaft, Abteilung Anorganische Chemie, Faradayweg 4–6, 14195 Berlin (Dahlem), Germany
T. P. Niesen
Affiliation:
Max-Planck-Institut für Metallforschung und Institut für Nichtmetallische Anorganische Materialien, Pulvermetallurgisches Laboratorium, Heisenbergstraβe 5, 70569 Stuttgart, Germany
J. Bill
Affiliation:
Max-Planck-Institut für Metallforschung und Institut für Nichtmetallische Anorganische Materialien, Pulvermetallurgisches Laboratorium, Heisenbergstraβe 5, 70569 Stuttgart, Germany
F. Aldinger
Affiliation:
Max-Planck-Institut für Metallforschung und Institut für Nichtmetallische Anorganische Materialien, Pulvermetallurgisches Laboratorium, Heisenbergstraβe 5, 70569 Stuttgart, Germany
M. R. De Guire
Affiliation:
Department of Materials Science and Engineering, Case Western Reserve University, 10900 Euclid Avenue, Cleveland, Ohio 44106–7204
M. Rühle
Affiliation:
Max-Planck-Institut für Metallforschung, Seestraβe 92, 70174 Stuttgart, Germany
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Abstract

Oxidic zirconium films prepared by chemical deposition from aqueous medium on sulfonic acid terminated self-assembled monolayers attached to an oxidized silicon surface were investigated with scanning electron microscopy and atomic force microscopy. Bulk precipitate forms in the 4 mM Zr(SO4)2 · 4H2O, 0.4 N HCl deposition medium at 343 K after approximately 30 min. Precipitate particles (200 nm and larger) were found embedded in the oxidic zirconium film and adsorbed on top of the film; they could be washed off, but patches of the film were removed. Working with unstable deposition solutions, in which homogeneous nucleation occurs, leads to preparation-inherent flaws in the film.

Type
Articles
Information
Journal of Materials Research , Volume 14 , Issue 9 , September 1999 , pp. 3725 - 3733
Copyright
Copyright © Materials Research Society 1999

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