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Characterization of metal-containing amorphous hydrogenated carbon films

Published online by Cambridge University Press:  31 January 2011

M. Wang ,
K. Schmidt ,
K. Reichelt ,
H. Dimigen  and
H. Hübsch
M. Wang
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich, D-5170 Jülich, Germany
K. Schmidt
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich, D-5170 Jülich, Germany
K. Reichelt
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich, D-5170 Jülich, Germany
H. Dimigen
Affiliation:
Fraunhofer-Institut für Schicht- und Oberflächentechnik, Vogt-Kölln-Straβe 30, D-2000 Hamburg 54, Germany
H. Hübsch
Affiliation:
Fraunhofer-Institut für Schicht- und Oberflächentechnik, Vogt-Kölln-Straβe 30, D-2000 Hamburg 54, Germany
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Abstract

Metal-containing amorphous hydrogenated carbon (Me–C: H) films were prepared on silicon substrates. Two kinds of metals (Ti, Ta) were incorporated in the process of reactive rf diode— (13.56 MHz) and DC-magnetron sputtering, respectively. Elastic recoil detection (ERD) and Rutherford backscattering (RBS) of MeV He+ ions were used to determine the hydrogen content and mass density of Me–C: H films. The mechanical properties, i.e., microhardness, Young's modulus, and adhesion, were measured with the help of a nanoindenter and scratch tester. Results show that (1) the mechanical properties of Me–C: H films depend mainly on metal concentrations. At a certain metal concentration, optimal hardness, Young's modulus, and critical load were obtained; (2) the M–C: H films with an optimal metal concentration possess similar hardness, Young's modulus, and higher critical load compared with the corresponding values of diamond-like carbon (a–C: H) films, due to the improvement of the toughness of the films by the incorporation of metals. Therefore, Me–C: H films show high promise of being wear-resistant protective coatings.

Type
Articles
Information
Journal of Materials Research , Volume 7 , Issue 3 , March 1992 , pp. 667 - 676
Copyright
Copyright © Materials Research Society 1992

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