Hostname: page-component-745bb68f8f-s22k5 Total loading time: 0 Render date: 2025-01-24T13:08:33.704Z Has data issue: false hasContentIssue false
  • English
  • Français

An examination of organometallic thermal stability and its relevance to low-temperature MOCVD growth of HgCdTe

Published online by Cambridge University Press:  31 January 2011

W. E. Hoke ,
P. J. Lemonias  and
R. Korenstein
W. E. Hoke
Affiliation:
Raytheon Research Division, 131 Spring Street, Lexington, Massachusetts 02173
P. J. Lemonias
Affiliation:
Raytheon Research Division, 131 Spring Street, Lexington, Massachusetts 02173
R. Korenstein
Affiliation:
Raytheon Research Division, 131 Spring Street, Lexington, Massachusetts 02173
Get access

Abstract

A well-established stability model for hydrocarbon molecules is reviewed and then applied to organometallic compounds used in the epitaxial growth of HgCdTe films. For hydrocarbon molecules, the strength of carbon-hydrogen bonds is modified by neighboring organic groups. The mechanism for this effect is delocalization of the free radical electronic charge by the neighboring groups. The delocalization effect is present in organometallic compounds and is illustrated for tellurium, mercury, and cadmium compounds. An important application of the delocalization effect is the development of a low-temperature approach for pyrolytic metalorganic growth of HgCdTe.

Type
Articles
Information
Journal of Materials Research , Volume 3 , Issue 2 , April 1988 , pp. 329 - 334
Copyright
Copyright © Materials Research Society 1988

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1Specht, L. T., Hoke, W. E., Oguz, S., Lemonias, P. J., Kreismanis, V. G., and Korenstein, R., Appl. Phys. Lett. 48, 417 (1986).CrossRefGoogle Scholar
2Faurie, J. P., Million, A., Boch, R., and Tissot, J. L., J. Vac. Sci. Technol. A 1, 1593 (1983).CrossRefGoogle Scholar
3Hoke, W. E. and Lemonias, P. J., Appl. Phys. Lett. 46, 398 (1985).CrossRefGoogle Scholar
4Hoke, W. E. and Lemonias, P. J., Appl. Phys. Lett. 48, 1669 (1986).CrossRefGoogle Scholar
5Hoke, W. E., Mater. Res. Soc. Symp. Proc. 90, 379 (1987).Google Scholar
6Korenstein, R., Hoke, W. E., Lemonias, P. J., Higa, K. T., and Harris, D. C., J. Appl. Phys. 62, 4929 (1987).CrossRefGoogle Scholar
7Irgolic, K. J., The Organic Chemistry of Tellurium (Gordon and Breach, New York, 1974).Google Scholar
8Morrison, R. T. and Boyd, R. N., Organic Chemistry (Allyn and Bacon, Boston, 1969), 2nd ed., pp. 118–130, 390-394.Google Scholar
9Handbook of Chemistry and Physics, edited by Weast, R. C. (CRC, Boca Raton, FL, 1986), 67th ed., pp. F178.Google Scholar
10The Chemistry of the Metal-Carbon Bond, edited by Hartley, F. R. and Patai, S. (Wiley, New York, 1982), Vol. 1, pp. 53–71.Google Scholar
11Comprehensive Chemical Kinetics, edited by Bamford, C. H. and Tipper, C. F. (Elsevier, New York, 1972), Vol. 4, pp. 215–233.Google Scholar
12The Chemistry of the Metal-Carbon Bond, edited by Hartley, F. R. and Patai, S. (Wiley, New York, 1985), Vol. 2, pp. 151–212, 559-599.Google Scholar
13Mullin, J. B., Irvine, S. J., and Ashen, D. J., J. Cryst. Growth 55, 92 (1981).CrossRefGoogle Scholar
14Organometallics for Vapor Phase Epitaxy (Alpha Products Catalog, Danvers, MA, 1986), pp. 90.Google Scholar