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Transmission electron microscopy microstructural characterization of Ti–Si–C–N coatings

Published online by Cambridge University Press:  31 January 2011

Yan Guo ,
Shengli Ma ,
Kewei Xu ,
Tom Bell ,
Xiaoying Li  and
Hanshan Dong
Yan Guo
Affiliation:
International Surface Engineering Research & Development Centre, Xi’an Jiaotong University, China
Shengli Ma
Affiliation:
International Surface Engineering Research & Development Centre, Xi’an Jiaotong University, China
Kewei Xu
Affiliation:
International Surface Engineering Research & Development Centre, Xi’an Jiaotong University, China
Tom Bell
Affiliation:
International Surface Engineering Research & Development Centre, Xi’an Jiaotong University, China; and Department of Metallurgy and Materials, The University of Birmingham, Birmingham B15 2TT, United Kingdom
Xiaoying Li
Affiliation:
Department of Metallurgy and Materials, The University of Birmingham, Birmingham B15 2TT, United Kingdom
Hanshan Dong*
Affiliation:
Department of Metallurgy and Materials, The University of Birmingham, Birmingham B15 2TT, United Kingdom
*
a)Address correspondence to this author. e-mail: [email protected]
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Abstract

A new type of Ti–Si–C–N coatings deposited on high-speed steel substrate by means of pulsed direct current (dc) plasma-enhanced chemical vapor deposition was investigated. The as-deposited coatings were characterized systematically by using energy-dispersive x-ray spectroscopy, x-ray diffraction (XRD), transmission electron microscopy (TEM), and microhardness with particular attention paid to the microstructure of the coatings. It has been shown that C content has a profound effect on the microstructure and hardness of coatings. TEM and XRD analyses revealed that these coatings consist of the dominate Ti(C, N) with a silicide (TiSi2, Si3N4, or SiC, depending on the C content in the coatings). The crystallite sizes are in the range of 8–35 nm, which decrease with increasing C content. The Ti–Si–C–N coatings with high C content (25.2–38.6 at.%) possess superhardness (41–48 GPa). This can be attributed to the grain refinement/grain boundary hardening and dispersion hardening of the hard, nanosized crystalline Si3N4 or SiC formed in the deposition.

Keywords

CoatingPlasma-enhanced CVD (PECVD) (deposition)Transmission electron microscopy (TEM)
Type
Articles
Information
Journal of Materials Research , Volume 23 , Issue 1 , January 2008 , pp. 198 - 203
Copyright
Copyright © Materials Research Society 2008

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References

REFERENCES

1Ma, S., Ma, D., Xu, K.Jie, W.: Structural characterization of nanocomposite Ti–Si–N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition. J. Vac. Sci. Technol., B 22, 1694 2004CrossRefGoogle Scholar
2Guo, Y., Ma, S.Xu, K.: Effects of carbon content and annealing temperature on the microstructure and hardness of super hard Ti–Si–C–N nanocomposite coatings prepared by pulsed d.c. PCVD. Surf. Coat. Technol. 210, 5240 2007CrossRefGoogle Scholar
3Wittmer, M., Noser, J.Melchior, H.: Oxidation kinetics of TiN thin films. J. Appl. Phys. 52(11), 6659 1981CrossRefGoogle Scholar
4He, J-W., Bai, C-D., Xu, K-W.Hu, N-S.: Improving the anticorrosion and mechanical behaviour of PACVD TiN. Surf. Coat. Technol. 74–75, 387 1995CrossRefGoogle Scholar
5Ding, X.Z., Zeng, X.T., Liu, Y.C., Yang, Q.Zhao, L.R.: Structure and mechanical properties of Ti–Si–N films deposited by combined DC/RF reactive unbalanced magnetron sputtering. J. Vac. Sci. Technol., A 22, 2351 2004CrossRefGoogle Scholar
6Bujak, J., Walkowicza, J.Kusiński, J.: Influence of the nitrogen pressure on the structure and properties of (Ti,Al)N coatings deposited by cathodic vacuum arc PVD process. Surf. Coat. Technol. 180–181, 150 2004CrossRefGoogle Scholar
7Karvánková, P., Vepřek-Heijman, M.G.J., Zawrah, M.F.Vepřek, S.: Thermal stability of nc-TiN/a-BN/a-TiB2 nanocomposite coatings deposited by plasma chemical vapor deposition. Thin Solid Films 467, 133 2004CrossRefGoogle Scholar
8Otani, Y.Hofmann, S.: High temperature oxidation behavior of (Ti1−xCrx)N coatings. Thin Solid Films 287, 188 1996CrossRefGoogle Scholar
9Hu, X., Zhang, H., Dai, J., Li, G.Gu, M.: Study on the superhardness mechanism of Ti–Si–N nanocomposite films: Influence of the thickness of the Si3N4 interfacial phase. J. Vac. Sci. Technol., A 23, 114 2005CrossRefGoogle Scholar
10Veprek, S.Reiprich, S.: A concept for the design of novel superhard coatings. Thin Solid Films 268, 64 1995CrossRefGoogle Scholar
11Hofmann, S.: Formation and diffusion properties of oxide films on metals and on nitride coatings studied with Auger electron spectroscopy and x-ray photoelectron spectroscopy. Thin Solid Films 193–194, 648 1990CrossRefGoogle Scholar
12Park, O-N., Park, J.H., Yoon, S-Y., Lee, M-H.Kim, K.H.: Tribological behavior of Ti–Si–N coating layers prepared by a hybrid system of arc ion plating and sputtering techniques. Surf. Coat. Technol. 179, 83 2004CrossRefGoogle Scholar
13García-Luis, A., Brizuela, T.M., Oñate, J.I., Sánchez-López, J.C., Martínez-Martínez, D., López-Cartes, C.Fernández, A.: Mechanical properties of nanocrystalline Ti–B–(N) coatings produced by DC magnetron sputtering. Surf. Coat. Technol. 200, 734 2005CrossRefGoogle Scholar
14Jeon, J-H., Choi, S.R., Chung, W.S.Kim, K.H.: Synthesis and characterization of quaternary Ti–Si–C–N coatings prepared by a hybrid deposition technique. Surf. Coat. Technol. 188–189, 415 2004CrossRefGoogle Scholar
15Musil, J.: Hard and superhard nanocomposite coatings. Surf. Coat. Technol. 125, 322 2000CrossRefGoogle Scholar
16PDF Nos. 35-0785, 33-1160, and 29-1131. International Center for Diffraction Data Newton Square, PA 1999Google Scholar
17Bond, G.M., Roberton, I.M.Birnbaum, H.K.: Effect of boron on the mechanism of strain transfer across grain boundaries in Ni3Al. J. Mater. Res. 2, 436 1987CrossRefGoogle Scholar
18Liu, Z-J., Shum, P.W.Shen, Y.G.: Hardening mechanisms of nanocrystalline Ti–Al–N solid solution films. Thin Solid Films 468, 161 2004CrossRefGoogle Scholar
19Lasalmonie, A.Strudel, J.L.: Influence of grain size on the mechanical behavior of some high strength materials. J. Mater. Sci. 21, 1837 1986CrossRefGoogle Scholar
20Masumura, R.A., Hazzledine, P.M.Pande, C.S.: Yield stress of fine grained materials. Acta Mater. 46, 4527 1998CrossRefGoogle Scholar
21Wiederhorn, S.M., Hockey, B.J.French, J.D.: Mechanisms of deformation of silicon nitride and silicon carbide at high temperatures. J. Eur. Ceram. Soc. 19, 2273 1999CrossRefGoogle Scholar
22Ogata, S., Hirosaki, N., Kocer, C.Shibutal, Y.: A comparative ab initio study of the “ideal” strength of single crystal α- and β-Si3N4. Acta Mater. 52, 233 2004CrossRefGoogle Scholar
23Borrero-López, O., Pajares, A., Ortiz, A.L.Guiberteau, F.: Hardness degradation in liquid-phase-sintered SiC with prolonged sintering. J. Eur. Ceram. Soc. 27, 3359 2007CrossRefGoogle Scholar