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Transmission Electron Microscopy and X-ray Diffraction Investigation of the Microstructure of Nanoscale Multilayer TiAlN/VN Grown by Unbalanced Magnetron Deposition

Published online by Cambridge University Press:  03 March 2011

Q. Luo ,
D.B. Lewis ,
P.Eh. Hovsepian  and
W-D. Münz
Q. Luo*
Affiliation:
Materials Research Institute, Sheffield Hallam University, Sheffield S1 1WB, United Kingdom
D.B. Lewis
Affiliation:
Materials Research Institute, Sheffield Hallam University, Sheffield S1 1WB, United Kingdom
P.Eh. Hovsepian
Affiliation:
Materials Research Institute, Sheffield Hallam University, Sheffield S1 1WB, United Kingdom
W-D. Münz
Affiliation:
Materials Research Institute, Sheffield Hallam University, Sheffield S1 1WB, United Kingdom
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

Cubic NaCl-B1 structured multilayer TiAlN/VN with a bi-layer thickness of approximately 3 nm and atomic ratios of (Ti+Al)/V = 0.98 to 1.15 and Ti/V = 0.55 to 0.61 were deposited by unbalanced magnetron sputtering at substrate bias voltages between -75 and -150 V. In this paper, detailed transmission electron microscopy and x-ray diffraction revealed pronounced microstructure changes depending on the bias. At the bias -75 V, TiAlN/VN followed a layer growth model led by a strong (110) texture to form a T-type structure in the Thornton structure model of thin films, which resulted in a rough growth front, dense columnar structure with inter-column voids, and low compressive stress of -3.8 GPa. At higher biases, the coatings showed a typical Type-II structure following the strain energy growth model, characterized by the columnar structure, void-free column boundaries, smooth surface, a predominant (111) texture, and high residual stresses between -8 and -11.5 GPa.

Keywords

MicrostructureCoatingIon beam assisted deposition
Type
Articles
Information
Journal of Materials Research , Volume 19 , Issue 4 , April 2004 , pp. 1093 - 1104
Copyright
Copyright © Materials Research Society 2004

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References

REFERENCES

1Helmersson, U., Todorova, S., Barnett, S.A., Sundgren, J.E., Market, L.C. and Greene, J.E.: Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness. J. Appl. Phys. 62, 481 (1987).CrossRefGoogle Scholar
2Shinn, M., Hultman, L. and Barnett, S.A.: Growth, structure and microhardness of epitaxial TiN/NbN superlattices. J. Mater. Res. 7, 901 (1992).CrossRefGoogle Scholar
3Mirkarimi, P.B., Barnett, S.A., Hubbard, K.M., Jervis, T.R. and Hultman, L.: Structure and mechanical properties of epitaxial TiN/V0.3Nb0.7N(100) superlattices. J. Mater. Res. 9, 1456 (1994).CrossRefGoogle Scholar
4Hultman, L., Wallenberg, L.R., Shinn, M. and Barnett, S.A.: Formation of polyhedral voids at surface cusps during growth of epitaxial TiN/NbN superlattice and alloy films. J. Vac. Sci. Technol. A10, 1618 (1992).CrossRefGoogle Scholar
5Barnett, S.A. and Shinn, M.: Plastic and elastic properties of compositionally modulated thin films. Annu. Rev. Mater. Sci. 24, 481 (1994).CrossRefGoogle Scholar
6Chu, X., Wong, M.S., Sproul, W.D., Rohde, S.L. and Barnett, S.A.: Deposition and properties of polycrystalline TiN/NbN superlattice coatings. J. Vac. Sci. Technol. A4, 1604 (1992).CrossRefGoogle Scholar
7Chu, X., Wong, M.S., Sproul, W.D. and Barnett, S.A.: Deposition, structure, and hardness of polycrystalline transition-metal nitride superlattice films. J. Mater. Res. 9, 1456 (1994).Google Scholar
8Hovsepian, P.Eh., Lewis, D.B. and Münz, W-D.: Recent progress in large scale manufacturing of multilayer/superlattice hard coatings. Surf. Coat. Technol. 133-134, 166 (2000).CrossRefGoogle Scholar
9Münz, W-D.: Proceedings of 1st French & German Conf. on High Speed Machining. J. Vac. Sci. Technol. A4, 2717 (1986).CrossRefGoogle Scholar
10Constable, C.P., Yarwood, J., Hovsepian, P.Eh., Donohue, L.A., Lewis, D.B., Münz, W-D.: Structural determination of wear debris generated from sliding wear tests on ceramic coatings using Raman microscopy. J. Vac. Sci. Technol. 18A, 1681 (2000).CrossRefGoogle Scholar
11Münz, W-D., Lewis, D.B., Hovsepian, P.Eh., Schönjahn, C., Ehiasarian, A., Smith, I.J.: Industrial scale manufactured superlattice hard PVD coatings. Surf. Eng. 17, 15 (2001).CrossRefGoogle Scholar
12Thornton, J.A.: Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings. J. Vac. Sci. Technol. 11, 666 (1974).CrossRefGoogle Scholar
13Messier, R., Giri, A.P. and Roy, R.A.: Revised structure zone model for thin film physical structure. J. Vac. Sci. Technol. A2, 500 (1984).CrossRefGoogle Scholar
14Grovenor, C.R.M., Hentzell, H.T.G. and Smith, D.A.: The development of grain-structure during growth of metallic-films. Acta. Metall. 32, 773 (1984).CrossRefGoogle Scholar
15Window, B. and Savvides, N.: Charged-particle fluxes from planar magentron sputtering sources. J. Vac. Sci. Technol. A4, 196 (1986).CrossRefGoogle Scholar
16Münz, W-D.: The unbalanced magnetron: current status of development. Surf. Coat. Technol. 48, 81 (1991).CrossRefGoogle Scholar
17Adibi, F., Petrov, I., Greene, J.E., Hultman, L. and Sundgren, J.E.: Effects of high flux low energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of TiAlN alloys grown by the ultra-high-vacuum reactive magnetron sputtering. J. Appl. Phys. 73, 8580 (1993).CrossRefGoogle Scholar
18Yehoda, J.E., Yang, B., Vedam, K. and Messier, R.: Investigation of the void structure in amorphous-germanium thin-films as a function of low-energy ion-bombardment. J. Vac. Sci. Technol. A6, 1631 (1988).CrossRefGoogle Scholar
19Hultman, L., Münz, W-D., Musil, J., Kadlec, S., Petrov, I. and Greene, J.E.: Low-energy (-100 eV) ion irradiation during growth of TiN deposited by reactive magentron sputtering—effects of ion flux on film microstructure. J. Vac. Sci. Technol. A9, 434 (1991).CrossRefGoogle Scholar
20Petrov, I., Adibi, F., Greene, J.E., Hultman, L. and Sundgren, J-E.: Average energy deposited per atom—a universal parameter for described ion-assisted film growth. Appl. Phys. Lett. 63, 36 (1993).CrossRefGoogle Scholar
21Hurkmans, T., Lewis, D.B., Pariton, H., Brooks, J.S. and Münz, W.D.: Influence of ion bombardment on structure and properties of unbalanced magnetron growth CrNx coatings. Surf. Coat. Technol. 114, 52 (1999).CrossRefGoogle Scholar
22Cotell, C.M. and Hirvonen, J.K.: Effect of ion energy on the mechanical properties of ion beam assisted deposition (IBAD) wear resistant coatings. Surf. Coat. Technol. 81, 118 (1996).CrossRefGoogle Scholar
23Knuyt, G., Quaeyhaegens, C., Haen, J.D. and Stals, L.M.: A model for texture evolution in a growing film. Surf. Coat. Technol. 76, 311 (1995).CrossRefGoogle Scholar
24Knuyt, G., Quaeyhaegens, C., Haen, J.D and Stals, L.M.: A quantitative model for the evolution from random orientation to a unique texture in PVD thin film growth. Thin Solid Films. 258, 159 (1995).CrossRefGoogle Scholar
25Oh, U.C. and Je, J.H.: Effects of stain-energy on the preferred orientation of TiN thin-films. J. Appl. Phys. 74, 1692 (1993).CrossRefGoogle Scholar
26Perry, A.J., Valvoda, V. and Rafaja, D.: On the residual stress and picostructure of titanium nitride films—II. A picostructural model. Vac. 45, 11 (1994).CrossRefGoogle Scholar
27Münz, W-D., Schulze, D. and Hauzer, F.: A new method for hard coatings: ABS (arc bond sputtering). Surf. Coat. Technol. 50, 169 (1992).CrossRefGoogle Scholar
28Donohue, L.A., Münz, W-D., Lewis, D.B., Cawley, J., Hurkmans, T., Trinh, T., Petrov, I. and Greene, J.E.: Large-scale fabrication of hard superlattice thin films by combined steered arc evaporation and unbalanced magnetron sputtering. Surf. Coat. Technol. 93, 69 (1997).CrossRefGoogle Scholar
29Petrov, I., Losbichler, P., Bergstrom, D., Greene, J.E., Münz, W-D., Hurkmans, T. and Trinh, T.: Ion-assisted growth of TiAlN/TiNbN multilayers by combined cathodic arc/magnetron sputtering deposition. Thin Solid Films. 302, 179 (1997).CrossRefGoogle Scholar
30Harris, G.B.: Philos. Mag. 43, 113 (1952).CrossRefGoogle Scholar
31Rickerby, D.S., Jones, A.M. and Bellamy, B.A.: X-ray-diffraction studies of physically vapour-deposited coatings. Surf. Coat. Technol. 37, 111 (1989).CrossRefGoogle Scholar
32Geist, D.E., Perry, A.J., Treglio, J.R., Valvoda, V. and Rafaja, D.: Adv. X-ray Analysis. Adv. X-Ray Anal. 38, 471 (1995).Google Scholar
33Valvoda, V., Perry, A.J., Hultman, L., Musil, J. and Kadlec, S.: On picostructural models of physically vapor-deposited films of titanium nitride. Surf. Coat. Technol. 49, 181 (1991).CrossRefGoogle Scholar
34Perry, A.J.: A contribution to the study of Poisson ratios and elastic-constants of TiN, ZrN and HfN. Thin Solid Films. 193194, 463 (1990).CrossRefGoogle Scholar
35Farges, G., Beauprez, E. and Catherine, M.C. Staine: Crystallographic structure of sputtered cubic delta-VN films: Influence of basic deposition parameters. Surf. Coat. Technol. 61, 238 (1993).CrossRefGoogle Scholar
36Lewis, D.B., Wadsworth, I.P., Münz, W-D., Kuzel, R. Jr. and Valvoda, V.: Structure and stress of TiAlN/CrN superlattice coatings as a function of CrN later thickness. Surf. Coat. Technol. 116119, 284 (1999).CrossRefGoogle Scholar
37Luo, Q., Rainforth, W.M. and Münz, W-D.: TEM observation of wear mechanisms of TiAlCrN and TiAlN/CrN coatings grown by combined steered-arc/unbalanced magnetron deposition. Wear 225–229, 74 (1999).CrossRefGoogle Scholar