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Synthesis of silicon-based polymerized films by excimer laser ablation deposition of hexaphenyldisilane

Published online by Cambridge University Press:  26 July 2012

Xiaoyan Zeng ,
Fabrice Rossignol ,
Shigeru Konno ,
Hideaki Nagai ,
Yoshinori Nakata ,
Takeshi Okutani  and
Masaaki Suzuki
Xiaoyan Zeng
Affiliation:
Hokkaido National Industrial Research Institute, 2–17-2-1, Tsukisamu-Higashi, Toyohira-ku, Sapporo 062-8517, Japan
Fabrice Rossignol
Affiliation:
Hokkaido National Industrial Research Institute, 2–17-2-1, Tsukisamu-Higashi, Toyohira-ku, Sapporo 062-8517, Japan
Shigeru Konno
Affiliation:
Hokkaido National Industrial Research Institute, 2–17-2-1, Tsukisamu-Higashi, Toyohira-ku, Sapporo 062-8517, Japan
Hideaki Nagai
Affiliation:
Hokkaido National Industrial Research Institute, 2–17-2-1, Tsukisamu-Higashi, Toyohira-ku, Sapporo 062-8517, Japan
Yoshinori Nakata
Affiliation:
Hokkaido National Industrial Research Institute, 2–17-2-1, Tsukisamu-Higashi, Toyohira-ku, Sapporo 062-8517, Japan
Takeshi Okutani
Affiliation:
Hokkaido National Industrial Research Institute, 2–17-2-1, Tsukisamu-Higashi, Toyohira-ku, Sapporo 062-8517, Japan
Masaaki Suzuki
Affiliation:
Hokkaido National Industrial Research Institute, 2–17-2-1, Tsukisamu-Higashi, Toyohira-ku, Sapporo 062-8517, Japan
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Extract

A new method of synthesizing silicon-based polymer films by excimer laser ablation of hexaphenyldisilane (HPDS) has been studied. The polymerized films were formed on a substrate by laser ablation deposition of HPDS at 248 nm. The structure of the polymerized films depended strongly on the laser fluence and repetition rates. The thermal stability and hardness of the deposited films were estimated by thermogravimetry and a Vickers microhardness meter. The films showed good thermal stability, depending on the laser processing parameters.

Type
Articles
Information
Journal of Materials Research , Volume 14 , Issue 1 , January 1999 , pp. 232 - 245
Copyright
Copyright © Materials Research Society 1999

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