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Surface precipitates on single crystal LiNbO3 after dry-etching by CHF3 plasma

Published online by Cambridge University Press:  31 January 2011

Kaori Shima ,
Naoki Mitsugi  and
Hirotoshi Nagata
Kaori Shima
Affiliation:
Advanced Materials Research Division, New Technology Research Laboratories, Sumitomo Osaka Cement Co., Ltd., 585 Toyotomi-cho, Funabashi-shi, Chiba 274, Japan
Naoki Mitsugi
Affiliation:
Optoelectronics Research Division, New Technology Research Laboratories, Sumitomo Osaka Cement Co., Ltd.,585 Toyotomi-cho, Funabashi-shi, Chiba 274, Japan
Hirotoshi Nagata
Affiliation:
Optoelectronics Research Division, New Technology Research Laboratories, Sumitomo Osaka Cement Co., Ltd.,585 Toyotomi-cho, Funabashi-shi, Chiba 274, Japan
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Abstract

The CHF3 electron cyclotron resonance (ECR) plasma etched LiNbO3 (LN) surface was analyzed chemically and crystallographically to investigate the dry-etch machining process for LN crystal, which was recently needed to obtain broader-band optical modulators. The etched surface was entirely covered with amorphous-like precipitates having ~70 nm diameter. These precipitates (or a part of them) were thought to be LiF from Auger electron and x-ray photoelectron spectroscopy. The results indicated that the LiF was formed and remained on the etched surface while the Nb was almost completely removed.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 3 , March 1998 , pp. 527 - 529
Copyright
Copyright © Materials Research Society 1998

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References

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