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Study on preparing PLT(28) thin film and its electro-optic effect

Published online by Cambridge University Press:  31 January 2011

Ai-Li Ding ,
Wei-Gen Luo ,
P. S. Qiu ,
J. W. Feng  and
R. T. Zhang
Ai-Li Ding
Affiliation:
Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China
Wei-Gen Luo
Affiliation:
Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China
P. S. Qiu
Affiliation:
Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China
J. W. Feng
Affiliation:
Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China
R. T. Zhang
Affiliation:
Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China
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Abstract

PLT(28) thin films deposited on glass substrates were studied by two sputtering processes. One is an in situ magnetron sputtering and the other is a low-temperature magnetron sputtering. The sintered PLT ceramic powders are used as a sputtering target for both processes. The influences of sputtering and annealing conditions on structure and crystallinity of the films were investigated. The electro-optic (E-O) properties of PLT(28) thin films prepared by the two processes were determined by a technique according to Faraday effect. The researches showed the E-O properties were strongly affected by the sputtering process. The film with larger grains exhibits stronger E-O effect. The quadratic E-O coefficient of PLT(28) thin film varies in the range of 0.1 × 10−16 to 1.0 × 10−16 (m/v)2.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 5 , May 1998 , pp. 1266 - 1270
Copyright
Copyright © Materials Research Society 1998

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References

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