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A review of monolithic and multilayer coatings within the boron–carbon–nitrogen system by ion-beam-assisted deposition

Published online by Cambridge University Press:  16 January 2012

Ignacio Jiménez ,
Ricardo Torres ,
Ignacio Caretti ,
Raul Gago  and
Jose María Albella
Ignacio Jiménez*
Affiliation:
Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), E-28049 Madrid, Spain
Ricardo Torres
Affiliation:
Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), E-28049 Madrid, Spain
Ignacio Caretti
Affiliation:
Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), E-28049 Madrid, Spain
Raul Gago
Affiliation:
Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), E-28049 Madrid, Spain
Jose María Albella
Affiliation:
Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), E-28049 Madrid, Spain
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

A review is given on the use of ion-beam-assisted deposition (IBAD) to the growth of films within the B–C–N system, both as monolithic and multilayer coatings. The films considered include elemental, binary, and ternary materials like pure carbon (diamond-like carbon), pure boron (B), boron nitrides (c‑BN, h‑BN, and BNx), boron carbides (B4C and BxC), carbon nitrides (CNx), and ternary BxCyNz. The use of non-reactive IBAD with argon ions and reactive IBAD with nitrogen ions is discussed in connection with control of the composition, physical and chemical sputtering, film density, internal stress, and promotion of metastable phases.

Keywords

Ion-beam-assisted depositionSputteringNitride
Type
Reviews
Information
Journal of Materials Research , Volume 27 , Issue 5: Focus Issue: Plasma and Ion-Beam Assisted Materials Processing , 14 March 2012 , pp. 743 - 764
Copyright
Copyright © Materials Research Society 2012

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References

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