Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-27T01:54:53.305Z Has data issue: false hasContentIssue false
  • English
  • Français

Photoluminescence of mesoporous silica films impregnated with an erbium complex

Published online by Cambridge University Press:  31 January 2011

Oun-Ho Park ,
Se-Young Seo ,
Ji-In Jung ,
Jae Young Bae  and
Byeong-Soo Bae
Oun-Ho Park
Affiliation:
Laboratory of Optical Materials and Coating (LOMC), Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Korea
Se-Young Seo
Affiliation:
Laboratory of Optical Materials and Coating (LOMC), Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Korea
Ji-In Jung
Affiliation:
Laboratory of Optical Materials and Coating (LOMC), Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Korea
Jae Young Bae
Affiliation:
Laboratory of Optical Materials and Coating (LOMC), Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Korea
Byeong-Soo Bae
Affiliation:
Laboratory of Optical Materials and Coating (LOMC), Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Korea
Get access

Abstract

Transparent mesoporous silica films were prepared by sol-gel spin coating on silicon wafers at room temperature. An erbium complex, erbium tris 8-hydroxyquinoline (ErQ), was homogeneously impregnated into the pores of the mesoporous silica films, and its concentration was easily controlled by using a solution immersing technique. The ErQ-impregnated mesoporous silica films show a room-temperature photoluminescence at 1.5 µm.

Type
Rapid Communications
Information
Journal of Materials Research , Volume 18 , Issue 5 , May 2003 , pp. 1039 - 1042
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Kik, P.G. and Polman, A., MRS Bull. 23(4), 48 (1998).CrossRefGoogle Scholar
2.Najafi, S., SPIE Proc. 2996, 54 (1997).CrossRefGoogle Scholar
3.Slooff, L.H., Polman, A., Wolbers, M.P. Oude, Veggel, F.C.J.M. van, Reinhoudt, D.N., and Hofstraat, J.W., J. Appl. Phys. 83, 497 (1998).CrossRefGoogle Scholar
4.Koppe, M., Brabec, C.J., Sariciftci, N.S., Eichen, Y., Nakhmanovich, G., Ehrenfreund, E., Epstein, O., and Heiss, W., Synthetic Metals 121, 1511 (2001).CrossRefGoogle Scholar
5.Kresge, C.T., Leonowicz, M.E., Roth, W.J., Vartuli, J.C., and Beck, J.S., Nature 359, 710 (1992).CrossRefGoogle Scholar
6.Marlow, F., McGehee, M.D., Zhao, D., Chmelka, B.F., Stucky, G.D., Adv. Mater. 11, 632 (1999).3.0.CO;2-Q>CrossRefGoogle Scholar
7.Klink, S.I., Hebbink, G.A., Grave, L., Veggel, F.C.J.M. van, Reinhoudt, , Slooff, L.H., Polman, A., and Hofstraat, J.W., Appl. Phys. 86, 1181 (1999).CrossRefGoogle Scholar
8.Beck, J.S., Vartuli, J.C., Roth, W.J., Leonowicz, M.E., Kresge, C.T., Schmitt, K.D., Chu, C.T-W., Olson, D.H., Sheppard, E.W., McCullen, S.B., Higgins, J.N., and Schlenker, J.L., J. Am. Chem. Soc. 114, 10834 (1992).CrossRefGoogle Scholar
9.Oliver, S., Kuperman, A., Coombs, N., Louth, A., and Ozin, G.A., Nature 378, 47 (1995).CrossRefGoogle Scholar
10.B.D. Cullity, Elements of X-ray Diffraction (Addison-Wesley, Boston, MA, 1987), p. 87.Google Scholar
11.Curry, R.J. and Gillin, W.P., Appl. Phys. Lett. 75, 1380 (1999).CrossRefGoogle Scholar
12.Miniscalco, W.J., J. Lightwave Techn. 9, 234 (1991).CrossRefGoogle Scholar