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Oxidation behavior of vacuum plasma-sprayed hafnium–tantalum nitrides

Published online by Cambridge University Press:  07 August 2015

Bradford C. Schulz ,
Daniel Butts  and
Gregory B. Thompson
Bradford C. Schulz
Affiliation:
Department of Metallurgical & Materials Engineering, The University of Alabama, Tuscaloosa, Alabama 35487-0202, USA
Daniel Butts
Affiliation:
Plasma Processes, LLC, Huntsville, Alabama 35811, USA
Gregory B. Thompson*
Affiliation:
Department of Metallurgical & Materials Engineering, The University of Alabama, Tuscaloosa, Alabama 35487-0202, USA
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

A series of (HfN)1−x(TaN)x, ceramics with x representing the starting powder blend compositions of 0.0, 18.8, 28.1, and 46.7 at.%, have been fabricated by vacuum plasma spraying. During the plasma spraying, the mixture lost approximately 25 at.% nitrogen facilitating the precipitation of metallic and metal-rich nitride phases. These specimens underwent static air oxidation exposure up to 1700 °C. In general, it was found that the addition of tantalum nitrides to the hafnium nitrides resulted in poorer oxidation behavior. However, the 18.8 at.% specimen deviated from this trend and had the lowest observed mass change. This specimen formed a dark-colored oxide scale, indexed as Hf6Ta2O17, which acted as a passivation layer. Within the scale, hafnium oxynitride phases were observed. A transformation pathway in forming these rhombohedral oxynitride phases is proposed by the filling in of oxygen in the light element interstitial locations of the rhombohedral ε-Hf3N2 and ζ-Hf4N3 structures.

Keywords

vacuum plasma sprayoxynitride scaleultra high-temperature ceramics
Type
Review
Information
Journal of Materials Research , Volume 30 , Issue 19: Focus Issue: Nitrides and Oxynitride Materials , 14 October 2015 , pp. 2949 - 2957
Copyright
Copyright © Materials Research Society 2015 

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