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Novel in situ production of smooth diamond films

Published online by Cambridge University Press:  31 January 2011

Donald R. Gilbert ,
Dong-Gu Lee  and
Rajiv K. Singh
Donald R. Gilbert
Affiliation:
Materials Science and Engineering, University of Florida, Gainesville, Florida 32611
Dong-Gu Lee
Affiliation:
Materials Science and Engineering, University of Florida, Gainesville, Florida 32611
Rajiv K. Singh
Affiliation:
Materials Science and Engineering, University of Florida, Gainesville, Florida 32611
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Extract

We have developed a unique method to produce smooth diamond films using a modified microwave plasma process system. This method consists of sequential in situ deposition and planarization in an electron cyclotron resonance plasma system. Diamond films were deposited to a thickness of 3.0 μm in this system at a pressure of 1.000 Torr from gas mixtures of methanol and hydrogen. Deposition was followed by planarization using a two-grid ion beam extraction process with a pure oxygen plasma at 10 mTorr. The average roughness of the diamond films so produced was as low as 30 nm, which was a factor of two lower than that of the as-deposited diamond films.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 7 , July 1998 , pp. 1735 - 1737
Copyright
Copyright © Materials Research Society 1998

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