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New approach to depositing yttria-stabilized zirconia buffer layers for coated conductors

Published online by Cambridge University Press:  06 January 2012

S. Sambasivan ,
I. Kim ,
S. Barnett ,
M. A. Zurbuchen ,
J. Ji ,
B. W. Kang ,
A. Goyal ,
P. N. Barnes  and
C. E. Oberly
S. Sambasivan
Affiliation:
Applied Thin Films, Inc., 1801 Maple Avenue, Evanston, Illinois 60201
I. Kim
Affiliation:
Applied Thin Films, Inc., 1801 Maple Avenue, Evanston, Illinois 60201
S. Barnett
Affiliation:
Applied Thin Films, Inc., 1801 Maple Avenue, Evanston, Illinois 60201
M. A. Zurbuchen
Affiliation:
Applied Thin Films, Inc., 1801 Maple Avenue, Evanston, Illinois 60201
J. Ji
Affiliation:
Applied Thin Films, Inc., 1801 Maple Avenue, Evanston, Illinois 60201
B. W. Kang
Affiliation:
Metals and Ceramics Division, Oak Ridge National Laboratory, P.O. Box 2008, MS 6116, Oak Ridge, Tennessee 37831–6116
A. Goyal
Affiliation:
Metals and Ceramics Division, Oak Ridge National Laboratory, P.O. Box 2008, MS 6116, Oak Ridge, Tennessee 37831–6116
P. N. Barnes
Affiliation:
Propulsion Directorate, U.S. Air Force Research Laboratory/PRPG, Building 450, 2645 Fifth Street, Suite 13, Wright-Patterson Air Force Base, Ohio 45433–7919
C. E. Oberly
Affiliation:
Propulsion Directorate, U.S. Air Force Research Laboratory/PRPG, Building 450, 2645 Fifth Street, Suite 13, Wright-Patterson Air Force Base, Ohio 45433–7919
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Abstract

A new approach for the production of yttria-stabilized zirconia (YSZ) oxide buffer layers directly on metal rolling-assisted biaxially textured substrates (RABiTS) is described in this paper. This represents a significant advance over existing techniques and avoids the need for complicated steps to avoid substrate oxidation during direct deposition of oxides. Current densities of about 1 MA/cm2 have been achieved for YBa2Cu3O7-δ layers on the YSZ buffer, with an intermediate CeO2 layer. The process consists of reactive sputtering of a YxZr1−xN film directly on the RABiTS, which adopts its biaxial texture. This nitride film is then converted to YSZ via a thermal oxidation step. The YSZ films retain the texture of the nitride film (and of the RABiTS) through local syntaxy. In many cases, YSZ films exhibit improved biaxial texture over that of the RABiTS substrate. Nitrides can be sputter deposited at much higher rates relative to oxides, making the approach industrially scalable and economical.

Type
Articles
Information
Journal of Materials Research , Volume 18 , Issue 4 , April 2003 , pp. 919 - 928
Copyright
Copyright © Materials Research Society 2003

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