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Microstructure of Film Growth from Filtrating Mono-dispersed Particle Suspension

Published online by Cambridge University Press:  31 January 2011

Feng Zhang  and
Siu-Wai Chan
Feng Zhang
Affiliation:
Department of Applied Physics and Applied Mathematics, Materials Research Science and Engineering Center, Columbia University, New York, New York 10027
Siu-Wai Chan*
Affiliation:
Department of Applied Physics and Applied Mathematics, Materials Research Science and Engineering Center, Columbia University, New York, New York 10027
*
a)Address all correspondence to this author. e-mail: [email protected]
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Extract

The deposition mechanism that determines the microstructure of colloidal films was investigated using a constant-filtration-rate procedure. In particular, we studied the dependence of the grain size on the filtration rate and the volume fraction of the particles in liquid. We correlated the surface diffusion distance to the final grain size and identified a processing window for large-grain colloidal films. The necessary conditions for homoepitaxy of colloidal crystals were successfully identified. In particular, the surface diffusion distance of deposited particles before embedment emerged as an important parameter for film microstructural control. Sufficiently long the diffusion distances correlated well with the slow deposition rates often required for crystal growth. Low deposition rates allowed more time for depositing particles to sample surface sites for low-energy configurations. This surface diffusion model for microstructure control has universal application to other film deposition methods for mono-dispersed particles.

Type
Articles
Information
Journal of Materials Research , Volume 17 , Issue 5 , May 2002 , pp. 1055 - 1060
Copyright
Copyright © Materials Research Society 2002

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