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Low crystallization temperature and unusual switching properties of ferroelectric Nb-doped Bi4Ti3O12 thin films prepared by rapid thermal annealing

Published online by Cambridge University Press:  31 January 2011

Jong Kuk Kim
Affiliation:
Department of Chemical Technology, Institute of Basic Science, Changwon National University, Changwon, Kyungnam, 641-773, Korea
Sang Su Kim
Affiliation:
Department of Physics, Institute of Basic Science, Changwon National University, Changwon, Kyungnam, 641-773, Korea
Jinheung Kim
Affiliation:
Department of Chemical Technology, Institute of Basic Science, Changwon National University, Changwon, Kyungnam, 641-773, Korea
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Abstract

Nb-doped Bi4Ti3O12 (Nb-BIT) ferroelectric thin films were prepared in the presence of a nonionic surfactant (pluronic P123) added as an additive to the sol solution and by rapid thermal annealing (RTA). The film annealed at the relatively low temperature of 600 °C was well crystallized and showed good ferroelectricity. The switching charge of capacitors with polarization reversal rapidly increased with a large amplitude and low frequency of the applied pulse, and gradually decreased with a small amplitude and high frequency. The remanent polarization (2Pr) after subjecting the Nb-BIT capacitors to 108 read/write cycles was 46 μC/cm2, which is remarkably higher than 20 μC/cm2 observed in the initial state. These phenomena seem to appear by the presence of space charges trapped after heat treatment by the RTA process.

Type
Articles
Copyright
Copyright © Materials Research Society 2003

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References

REFERENCES

Lee, S-H., Lee, J-K., and Yoon, K.H., J. Mater. Res. 17, 1455 (2002).CrossRefGoogle Scholar
Aizawa, K. and Ishiwara, H., Jpn. J. Appl. Phys. 39, L1191 (2000).CrossRefGoogle Scholar
Watanabe, T., Funakubo, H., and Saito, K., J. Mater. Res. 16, 303 (2001).CrossRefGoogle Scholar
Park, B.H., Kang, B.S., Bu, S.D., Noh, T.W., Lee, J., and Jo, W., Nature 401, 682 (1999).CrossRefGoogle Scholar
Chon, U., Kim, K., Jang, H.M., and Yi, G., Appl. Phys. Lett. 79, 3137 (2001).CrossRefGoogle Scholar
Kim, S.S., Song, T.K., Kim, J.K., and Kim, J., J. Appl. Phys. 92, 2213 (2002).CrossRefGoogle Scholar
Kim, J.K., Kim, J., Song, T.K., and Kim, S.S., Thin Solid Films 419, 225 (2002).CrossRefGoogle Scholar
Watanabe, T., Runakubo, H., Osada, M., Noguchi, Y., and Miyayama, M., Appl. Phys. Lett. 80, 100 (2002).CrossRefGoogle Scholar
Wu, D., Li, A., Zhu, T., Li, Z., Liu, Z., and Ming, N., J. Mater. Res. 16, 1325 (2001).CrossRefGoogle Scholar
Okamura, S., Takaoka, M., Nishida, T., and Shiosaki, T., Jpn. J. Appl. Phys. 39, 5481 (2000).CrossRefGoogle Scholar
Wu, D., Li, A., Ling, H., Yu, T., Liu, Z., and Ming, N., Appl. Phys. Lett. 76, 2208 (2000).CrossRefGoogle Scholar
Zhang, Z.G., Liu, J.S., Wang, Y.N., Zhu, J.S., Yan, F., Chen, X.B., Shen, H.M., Appl. Phys. Lett. 73, 788 (1998).CrossRefGoogle Scholar
Dimos, D., Al-Shareef, H.N., Warren, W.L., Tuttle, B.A., J. Appl. Phys. 80, 1682 (1996).CrossRefGoogle Scholar
Joshi, P.C. and Krupanidhi, S.B., J. Appl. Phys. 72, 5827 (1992).CrossRefGoogle Scholar
Araújo, E.B. and Eiras, J.A., J. Europ. Ceram. Soc. 21, 1513 (2001).CrossRefGoogle Scholar
Wu, D., Li, A., Zhu, T., Liu, Z., and Ming, N., J. Appl. Phys. 88, 5941 (2000).CrossRefGoogle Scholar
Joshi, P.C., Mansingh, A., Kamalasanan, M.N., and Chandra, S., Appl. Phys. Lett. 59, 2389 (1991).CrossRefGoogle Scholar