Hostname: page-component-586b7cd67f-2plfb Total loading time: 0 Render date: 2024-11-26T06:36:42.088Z Has data issue: false hasContentIssue false
  • English
  • Français

Interfacial adhesion of nanoporous zeolite thin films

Published online by Cambridge University Press:  01 February 2006

Lili Hu ,
Junlan Wang ,
Zijian Li ,
Shuang Li  and
Yushan Yan
Lili Hu
Affiliation:
Department of Mechanical Engineering, University of California, Riverside, California 92521
Junlan Wang*
Affiliation:
Department of Mechanical Engineering, University of California, Riverside, California 92521
Zijian Li
Affiliation:
Department of Chemical and Environmental Engineering, University of California, Riverside, California 92521
Shuang Li
Affiliation:
Department of Chemical and Environmental Engineering, University of California, Riverside, California 92521
Yushan Yan
Affiliation:
Department of Chemical and Environmental Engineering, University of California, Riverside, California 92521
*
a)Address all correspondence to this author. e-mail: [email protected]
Get access

Abstract

Nanoporous silica zeolite thin films are promising candidates for future generation low-dielectric constant (low-k) materials. During the integration with metal interconnects, residual stresses resulting from the packaging processes may cause the low-k thin films to fracture or delaminate from the substrates. To achieve high-quality low-k zeolite thin films, it is important to carefully evaluate their adhesion performance. In this paper, a previously reported laser spallation technique is modified to investigate the interfacial adhesion of zeolite thin film-Si substrate interfaces fabricated using three different methods: spin-on, seeded growth, and in situ growth. The experimental results reported here show that seeded growth generates films with the highest measured adhesion strength (801 ± 68 MPa), followed by the in situ growth (324 ± 17 MPa), then by the spin-on (111 ± 29 MPa). The influence of the deposition method on film–substrate adhesion is discussed. This is the first time that the interfacial strength of zeolite thin films-Si substrates has been quantitatively evaluated. This paper is of great significance for the future applications of low-k zeolite thin film materials.

Keywords

AdhesionLaserZeolite
Type
Articles
Information
Journal of Materials Research , Volume 21 , Issue 2 , February 2006 , pp. 505 - 511
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Johnson, M., Li, Z., Wang, J. and Yan, Y.: Mechanical characterization of zeolite low-dielectric-constant thin films by nanoindentation. Thin Solid Films 2005, accepted.Google Scholar
2.Yan, Y., Li, S. and Li, Z.: Pure-silica-zeolite low-dielectric constant films: Present and the future. Zeolite News Lett. 20, 111 (2003).Google Scholar
3.Breck, D.W.: Zeolite Molecular Sieves: Structure, Chemistry, and Use (Wiley, New York, 1974).Google Scholar
4.Baerlocher, C., Meier, W.M. and Olson, D.H.: Atlas of Zeolite Framework Types, 5th ed. (Elsevier, New York and Amsterdam, 2001).Google Scholar
5.Tuan, V.A., Li, S.G., Falconer, J.L. and Noble, R.D.: Separating organics from water by pervaporation with isomorphously-substituted mfi zeolite membranes. J. Membr. Sci. 196, 111 (2002).CrossRefGoogle Scholar
6.Tanaka, K., Yoshikawa, R., Ying, C., Kita, H. and Okamoto, K.: Application of zeolite t membrane to vapor-permeation-aided esterification of lactic acid with ethanol. Chem. Eng. Sci. 57, 1577 (2002).CrossRefGoogle Scholar
7.Yan, Y.G. and Bein, T.: Molecular recognition on acoustic-wave devices—sorption in chemically anchored zeolite monolayers. J. Phys. Chem. 96, 9387 (1992).CrossRefGoogle Scholar
8.Vella, J.B., Volinsky, A.A., Adhihetty, I.S., Edwards, N.V. and Gerberich, W.W. Nanoindentation of silicate low-k dielectric thin films, in Silicon Materials—Processing, Characterization and Reliability, edited by Veteran, J.L.O’Meara, D.L., Misra, V., and Ho, P.S. (Mater. Res. Soc. Symp. Proc. 716 Warrendale, PA, 2002), B12.13.1-6, p. 619.Google Scholar
9.Volinsky, A., Vella, J. and Gerberich, W.: Fracture toughness, adhesion and mechanical properties of low-k dielectric thin films measured by nanoindentation. Thin Solid Films 429, 201 (2003).CrossRefGoogle Scholar
10.Vossen, J.L. Measurement of film-substrate bond strength by laser spallation, in Adhesion Measurement of Thin Films, Thick Films and Bulk Coatings, edited by Mittal, K.L. (ASTM, Philadelphia, PA, 1978), pp. 122–133.CrossRefGoogle Scholar
11.Kobayashi, A., Jain, A., Gupta, V. and Kireev, V.: Study on the interface strength of zirconia coatings by a laser spallation technique. Vacuum 73, 533 (2004).CrossRefGoogle Scholar
12.Wang, H.T., Holmberg, B.A., Huang, L.M., Wang, Z.B., Mitra, A., Norbeck, J.M. and Yan, Y.S.: Nafion-bifunctional silica composite proton conductive membranes. J. Mater. Chem. 12, 834 (2002).CrossRefGoogle Scholar
13.Wang, H., Holmberg, B.A. and Yan, Y.: Direct synthesis of template-free zeolite nanocrystals within in-situ thermoreversible polymer hydrogels. J. Am. Chem. Soc. 125, 9928 (2003).CrossRefGoogle Scholar
14.Wang, J., Weaver, R.L. and Sottos, N.R.: Laser-induced decompression shock development in fused silica. J. Appl. Phys. 93, 9529 (2003).CrossRefGoogle Scholar
15.Wang, J., Sottos, N.R. and Weaver, R.L.: Mixed-mode failure of thin films using laser-generated shear waves. Exp. Mech. 43, 323 (2003).CrossRefGoogle Scholar
16.Wang, J., Sottos, N.R. and Weaver, R.L.: Tensile and mixed-mode strength of a thin film-substrate interface under laser induced pulse loading. J. Mech. Phys. Solids 52, 999 (2004).CrossRefGoogle Scholar
17.Wang, Z., Mitra, A., Wang, H., Huang, L. and Yan, Y.: Pure silica zeolite films as low-k dielectrics by spin-on of nanoparticle suspension. Adv. Mater. 13, 1463 (2001).3.0.CO;2-H>CrossRefGoogle Scholar
18.Wang, Z., Wang, H., Mitra, A., Huang, L. and Yan, Y.: Pure-silica zeolite low-k dielectric thin films. Adv. Mater. 13, 746 (2001).3.0.CO;2-J>CrossRefGoogle Scholar
19.Li, Z.J., Lew, C.M., Li, S.A., Medina, D.I. and Yan, Y.S.: Pure-silica-zeolite mel low-k films from nanoparticle suspensions. J. Phys. Chem. B 109, 8652 (2005).CrossRefGoogle ScholarPubMed
20.Lovallo, M.C. and Tsapatsis, M.: Preferentially oriented submicron silicalite membranes. AIChE J. 42, 3020 (1996).CrossRefGoogle Scholar