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Excimer laser ablation of aluminum nitride

Published online by Cambridge University Press:  31 January 2011

Janet K. Lumpp  and
Susan D. Allen
Janet K. Lumpp
Affiliation:
Department of Electrical Engineering, University of Kentucky, Lexington, Kentucky 40506–0046
Susan D. Allen
Affiliation:
Departments of Chemistry and Electrical Engineering, Florida State University, Tallahassee, Florida 32306–4093
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Abstract

Excimer laser wavelengths ablate aluminum nitride at rates up to 0.2 μm/pulse where the rate increases with decreasing background pressure and increasing fluence. The ablation threshold for AlN at 248 nm is approximately 2 J/cm2. Blind vias are produced with flat bottoms, straight walls, and a decomposed metallic layer remaining on the surface. Ablation rate dependence on fluence saturates at high fluences due to absorption by the ablation plume. The influence of processing variables on ablation rate and ablation mechanisms are discussed. Statistical design of experiments is used to compare data sets.

Type
Articles
Information
Journal of Materials Research , Volume 12 , Issue 1 , January 1997 , pp. 218 - 225
Copyright
Copyright © Materials Research Society 1997

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