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Electroless polyol deposition of FeNi-based powders and films

Published online by Cambridge University Press:  31 January 2011

H. Yin
Affiliation:
Department of Materials Science, National University of Singapore, Singapore 119260, Republic of Singapore
G. M. Chow*
Affiliation:
Department of Materials Science, National University of Singapore, Singapore 119260, Republic of Singapore
*
a) Address all correspondence to this author. e-mail: [email protected]
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Abstract

Iron-nickel-based powders and thin films were synthesized by an electroless polyol method. The growth process as a function of deposition time was studied. The Fe concentration of deposited films and precipitated powders were similar and independent of deposition time. The metalorganic intermediates were present in powders and their amount decreased with time. The morphological investigations suggested that 60 min was the optimum deposition time to deposit dense films with particles of narrow size distribution. In addition, the films deposited at 60 min also possessed the highest saturation magnetization due to a more ordered atomic environment of nickel. The as-deposited Fe was apparently oxidized in the films.

Type
Articles
Copyright
Copyright © Materials Research Society 2003

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References

REFERENCES

1.Sanguesa, C.D., Urbina, R.H., and Figlarz, M., J. Solid State Chem. 100, 272 (1992).CrossRefGoogle Scholar
2.Sanguesa, C.D., Urbina, R.H., and Figlarz, M., Solid State Ionics 63, 25 (1993).Google Scholar
3.Fievet, F., Vincent, F.F., Lagier, J.P., Dumont, B., Figlarz, M., J. Mater. Chem. 3, 627 (1993).Google Scholar
4.Hedge, M.S., Larcher, D., Dupont, L., Beaudoin, B., Elhsissen, K.T., and Tarasco, J.M., Solid State Ionics 97, 33 (1997).Google Scholar
5.Chow, G.M., Kurihara, L.K., Kemner, K.M., Schoen, P.E., Elam, W.T., Ervin, A., Keller, S., Zhang, Y.D., Budnick, J., and Ambrose, T., J. Mater. Res. 10, 1546 (1995).CrossRefGoogle Scholar
6.Zhang, J., Chow, G.M., Lawrence, S.H., and Feng, C.R., Mater. Phys. Mech. 1, 11 (2000).Google Scholar
7.Chow, G.M., Ding, J., and Zhang, J., Appl. Phys. Lett. 80, 1028 (2002).Google Scholar
8.Chow, G.M., Ding, J., Zhang, J., Lee, K.Y., Surani, D., and Lawrence, S.H., Appl. Phys. Lett. 74, 1889 (1999).Google Scholar
9.Blackwood, D.J., Li, Y.Y., and Chow, G.M., J. Electrochem. Soc. 149, D27 (2002).CrossRefGoogle Scholar
10.Yaron, A.A., Clement, C.L., and Hutchison, J.L., Electrochem. Solid State Lett. 12, 627 (1999).Google Scholar
11.Fievet, F., Lagier, J.P., Blin, B., Beaudoin, B., and Figlarz, M., Solid State Ionics 32(33), 198 (1989).Google Scholar
12.Masukao, N., Osaka, T., and It, Y., Electrochemical Technology: Innovation and New Developments (Gordon and Breach Publishers, Kodansha Ltd. Tokyo, Japan, 1996), p. 226.Google Scholar
13.Bruss, D.B. and Veies, T.D., J. Am. Chem. Soc. 78, 733 (1956).Google Scholar
14.Viau, G., Vincent, F.F., and Fievet, F., J. Mater. Chem. 6, 1047 (1996).CrossRefGoogle Scholar
15.Yin, H. and Chow, G.M., J. Electrochem. Soc. 149, C68 (2002).Google Scholar
16.Pilling, M.J. and Seakins, P.W., Reaction Kinetics (Oxford University Press, New York, 1995).Google Scholar
17.Wagner, C., Prog. Solid State Chem. 10, 3 (1975).Google Scholar
18.Sauert, F., Rhonhof, E.S., and Wang, S.S., in Thermochemical Data of Pure Substance (VCH Verlagsgesellschaft, Weinheim, Germany, 1998), pp. 561564.Google Scholar
19.Yin, H., Chan, H.S.O., and Chow, G.M., Mater. Phys. Mech. 4, 56 (2001).Google Scholar
20.Ressler, T., J. Phys. IV 7, C2 (1997).Google Scholar
21.Roberston, N., Hu, H.L., and Tsang, C., IEEE Trans. Magn. 33, 2818 (1997).Google Scholar