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Effect of solvents and stabilizers on sol–gel deposition of Ga-doped zinc oxide TCO films

Published online by Cambridge University Press:  09 May 2011

Ido Winer
Affiliation:
Chemical Engineering Department, Technion, Haifa 32000, Israel
Gennady E. Shter
Affiliation:
Chemical Engineering Department, Technion, Haifa 32000, Israel
Meirav Mann-Lahav
Affiliation:
Chemical Engineering Department, Technion, Haifa 32000, Israel
Gideon S. Grader*
Affiliation:
Chemical Engineering Department, Technion, Haifa 32000, Israel
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

Gallium-doped zinc oxide spin-coated thin films have been prepared by the sol–gel method. The influence of two solvents, isopropanol and 2-methoxyethanol (2-ME), and two chelating agents, monoethanolamine (MEA) and diethanolamine (DEA), was investigated. X-ray diffraction shows preferential (002) c-axis orientation of the crystallites influenced by the doping content and starting solution composition. Better orientation was obtained with 2-ME as a solvent because of a slower evaporation rate during the spin coating. Better orientation was also obtained using MEA as a stabilizer due to the weaker bonds formed with the Zn2+ ions. Typical film thickness was 550 nm. The transparency of the films was greater than 85% in the entire visible range. A sheet resistance of 68 Ω/□ was obtained for the ZnO film doped with 2 at.% of Ga using 2-ME and MEA as a solvent and stabilizer, respectively. The results show that the denser packing created using a high boiling temperature solvent and a low organic content stabilizer improved the layer’s electrical and optical properties.

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Articles
Copyright
Copyright © Materials Research Society 2011

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References

REFERENCES

1.Sutthana, S., Hongsith, N., and Choopun, S.: AZO/Ag/AZO multilayer films prepared by DC magnetron sputtering for dye-sensitized solar cell application. Curr. Appl. Phys. 10, 813 (2010).CrossRefGoogle Scholar
2.Calnan, S., Upadhyaya, H.M., Thwaites, M.J., and Tiwari, A.N.: Properties of indium tin oxide films deposited using high target utilisation sputtering. Thin Solid Films 515, 6045 (2007).CrossRefGoogle Scholar
3.Bhosle, V., Tiwari, A., and Narayan, J.: Metallic conductivity and metal-semiconductor transition in Ga-doped ZnO. Appl. Phys. Lett. 88, 1 (2006).CrossRefGoogle Scholar
4.Fathollahi, V. and Amini, M.M.: Sol-gel preparation of highly oriented gallium-doped zinc oxide thin films. Mater. Lett. 50, 235 (2001).CrossRefGoogle Scholar
5.Luna-Arredondo, E.J., Maldonado, A., Asomoza, R., Acosta, D.R., Meléndez-Lira, M.A., and Olvera, M.D.L.L.: Indium-doped ZnO thin films deposited by the sol-gel technique. Thin Solid Films 490, 132 (2005).CrossRefGoogle Scholar
6.Kuo, S.-Y., Chen, W.-C., Lai, F.-I., Cheng, C.-P., Kuo, H.-C., Wang, S.-C., and Hsieh, W.-F.: Effects of doping concentration and annealing temperature on properties of highly oriented Al-doped ZnO films. J. Cryst. Growth 287, 78 (2006).CrossRefGoogle Scholar
7.Beyer, W., Hüpkes, J., and Stiebig, H.: Transparent conducting oxide films for thin film silicon photovoltaics. Thin Solid Films 516, 147 (2007).CrossRefGoogle Scholar
8.Majumder, S.B., Jain, M., Dobal, P.S., and Katiyar, R.S.: Investigations on solution derived aluminium doped zinc oxide thin films. Mater. Sci. Eng. B 103, 16 (2003).CrossRefGoogle Scholar
9.Lin, K.-M. and Tsai, P.: Parametric study on preparation and characterization of ZnO:Al films by sol-gel method for solar cells. Mater. Sci. Eng. B 139, 81 (2007).CrossRefGoogle Scholar
10.Yim, K., Kim, H.W., and Lee, C.: Effects of annealing on structure, resistivity and transmittance of Ga doped ZnO films. Mater. Sci. Technol. 23, 108 (2007).CrossRefGoogle Scholar
11.Huang, Y.-C., Li, Z.-Y., Chen, H.-H., Uen, W.-Y., Lan, S.-M., Liao, S.-M., Huang, Y.-H., Ku, C.-T., Chen, M.-C., Yang, T.-N., and Chiang, C.-C.: Characterizations of gallium-doped ZnO films on glass substrate prepared by atmospheric pressure metal-organic chemical vapor deposition. Thin Solid Films 517, 5537 (2009).CrossRefGoogle Scholar
12.Gong, L., Ye, Z., Lu, J., Zhu, L., Huang, J., Gu, X., and Zhao, B.: Highly transparent conductive and near-infrared reflective ZnO:Al thin films. Vacuum 84, 947 (2010).CrossRefGoogle Scholar
13.Lu, J.J., Tsai, S.Y., Lu, Y.M., Lin, T.C., and Gan, K.J.: Al-doping effect on structural, transport and optical properties of ZnO films by simultaneous RF and DC magnetron sputtering. Solid State Commun. 149, 2177 (2009).CrossRefGoogle Scholar
14.Wienke, J. and Booij, A.S.: ZnO:In deposition by spray pyrolysis—Influence of the growth conditions on the electrical and optical properties. Thin Solid Films 516, 4508 (2008).CrossRefGoogle Scholar
15.Lin, K. and Chen, Y.-Y.: Improvement of electrical properties of sol–gel derived ZnO:Ga films by infrared heating method. J. Sol-Gel Sci. Technol. 51, 215 (2009).CrossRefGoogle Scholar
16.Lin, K. Chen, Y.-Y., and Chiu, C.: Effects of growth behaviors on chemical and physical properties of sol–gel derived ZnO: Ga films. J. Sol-Gel Sci. Technol. 55, 299 (2010).CrossRefGoogle Scholar
17.Kim, Y.-S., Tai, W.-P., and Shu, S.-J.: Effect of preheating temperature on structural and optical properties of ZnO thin films by sol-gel process. Thin Solid Films 491, 153 (2005).CrossRefGoogle Scholar
18.Ohya, Y., Saiki, H., Tanaka, T., and Takahashi, Y.: Microstructure of TiO2 and ZnO films fabricated by the sol-gel method. Am. Ceram. Soc. 79, 825 (1996).CrossRefGoogle Scholar
19.Mridha, S. and Basak, D.: Aluminium doped ZnO films: Electrical, optical and photoresponse studies. J. Phys. D 40, 6902 (2007).CrossRefGoogle Scholar
20.Xue, S.W., Zu, X.T., Zheng, W.G., Chen, M.Y., and Xiang, X.: Effects of annealing and dopant concentration on the optical characteristics of ZnO:Al thin films by sol-gel technique. Physica B 382, 201 (2006).CrossRefGoogle Scholar
21.Yoon, S.H., Liu, D., Shen, D., Park, M., and Kim, D.-J.: Effect of chelating agents on the preferred orientation of ZnO films by sol-gel process. Mater. Sci. 43, 6177 (2008).CrossRefGoogle Scholar
22.Nayak, P.K., Yang, J., Kim, J., Chung, S., Jeong, J., Lee, C., and Hong, Y.: Spin-coated Ga-doped ZnO transparent conducting thin films for organic light-emitting diodes. J. Phys. D 42, 035102 (2009).CrossRefGoogle Scholar
23.Burstein, E.: Anomalous optical absorption limit in InSb. Phys. Rev. 93, 632 (1954).CrossRefGoogle Scholar
24.Moss, T.S.: The interpretation of the properties of indium antimonide. Proc. Phys. Soc. B 67, 775 (1954).CrossRefGoogle Scholar
25.Cheong, K.Y., Muti, N., and Ramanan, S.R.: Electrical and optical studies of ZnO:Ga thin films fabricated via the sol-gel technique. Thin Solid Films 410, 142 (2002).CrossRefGoogle Scholar